公开(公告)号：US10429748B2

公开(公告)日：2019-10-01

申请号：US15576444

申请日：2016-06-06

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Joseph Harry Lyons ,  Martinus Cornelis Reijnen ,  Erik Johan Arlemark ,  Nicolae Marian Ungureanu ,  James Hamilton Walsh

IPC: G03F7/20 ,  G01B13/12 ,  G03F9/00

Abstract: An apparatus, such as a lithographic apparatus, has a metrology frame that has a reference frame mounted thereon that includes a reference surface. A gas gauge is movable relative to the reference frame, metrology frame, and a measured surface. A reference nozzle in the gas gauge provides gas to the reference surface and a measurement nozzle provides gas to the measured surface. A microelectromechanical (MEM) sensor may be used with the gas gauge to sense a difference in backpressure from each of the reference nozzle and the measurement nozzle. Optionally, multiple gas gauges are positioned in an array, which may extend in a direction that is substantially parallel to a plane of the measured surface. The gauges may be fluidly connected to a reference nozzle of the gas gauge. A channel may distribute gas across the array.

公开(公告)号：US11480885B2

公开(公告)日：2022-10-25

申请号：US17291302

申请日：2019-10-22

Applicant: ASML Holding N.V.

Inventor： James Hamilton Walsh ,  Richard John Johnson ,  Christopher Rossi Vann

IPC: G03F7/20

Abstract: An apparatus for and method of cleaning a surface of a support structure in a lithographic system in which a cleaning substrate has at least one motor which causes the cleaning substrate to move laterally across the surface. The cleaning substrate may be provided with a power supply mounted on the cleaning substrate and selectably electrically connectable to the motor.