公开(公告)号：US11656555B2

公开(公告)日：2023-05-23

申请号：US17605601

申请日：2020-04-14

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Janardan Nath ,  Kalyan Kumar Mankala ,  Todd R. Downey ,  Joseph Harry Lyons ,  Ozer Unluhisarcikli ,  Alexander Harris Ledbetter ,  Nicholas Stephen Apone ,  Tian Gang

IPC: G03F7/20

CPC classification number: G03F7/70191 ,  G03F7/70083 ,  G03F7/70133

Abstract: An illumination adjustment apparatus, to adjust a cross slot illumination of a beam in a lithographic apparatus, includes a plurality of fingers to adjust the cross slot illumination to conform to a selected intensity profile. Each finger has a distal edge that includes at least two segments. The two segments form an indentation of the distal edge.