公开(公告)号：US20230008474A1

公开(公告)日：2023-01-12

申请号：US17773004

申请日：2020-10-05

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Victor Antonio PEREZ-FALCON ,  Marcus Adrianus VAN DE KERKHOF ,  Daniel Leslie HALL ,  Christopher John MASON ,  Arthur Winfried Eduardus MINNAERT ,  Johannes Hubertus Josephina MOORS ,  Samir A. NAYFEH

IPC: H02N13/00 ,  G03F7/20

Abstract: Embodiments herein describe methods, devices, and systems for reducing an electric field at a clamp-reticle interface using an enhanced electrostatic clamp. In particular, the electrostatic clamp includes a clamp body, an electrode layer disposed on a top surface of the clamp body, and a plurality of burls that project from a bottom surface of the clamp body, wherein the electrode layer comprises a plurality of cutouts at predetermined locations that vertically correspond to locations of the plurality of burls at the bottom surface of the clamp body.

公开(公告)号：US20220075277A1

公开(公告)日：2022-03-10

申请号：US17418478

申请日：2019-12-12

Applicant: ASML Holding N.V.

Inventor： Jeffrey John LOMBARDO ,  Ronald Peter ALBRIGHT ,  Daniel Leslie HALL ,  Victor Antonio PEREZ-FALCON ,  Andrew JUDGE

IPC: G03F7/20

Abstract: Methods and systems are described for reducing particulate contaminants on a clamping face of a clamping structure in a lithographic system. A substrate such as a cleaning reticle is pressed against the clamping face. A temperature differential is established between the substrate and the clamping face either before or after clamping occurs to facilitate transfer of particles from the clamping face to the substrate.