公开(公告)号：US20190196341A1

公开(公告)日：2019-06-27

申请号：US16328750

申请日：2017-08-18

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Kevin J VIOLETTE ,  Igor Matheus Petronella AARTS ,  Haico Victor KOK ,  Eric Brian CATEY

IPC: G03F7/20 ,  G03F9/00

Abstract: A method, including printing an apparatus mark onto a structure while the structure is at least partly within a lithographic apparatus. The structure may be part of, or is located on, a substrate table, but is separate from a substrate to be held by the apparatus. The method further includes measuring the apparatus mark using a sensor system within the apparatus.

公开(公告)号：US20200326640A1

公开(公告)日：2020-10-15

申请号：US16760137

申请日：2018-10-26

Applicant: ASML Holding N.V.

Inventor： Irit TZEMAH ,  Eric Brian CATEY ,  John David CONNELLY

IPC: G03F9/00 ,  G03F7/20

Abstract: A lithographic cluster includes a track unit and a lithographic apparatus. The lithographic apparatus includes an alignment sensor and at least one controller. The track unit is configured to process a first lot and a second lot. The lithographic apparatus is operatively coupled to the track unit. The alignment sensor is configured to measure an alignment of at least one alignment mark type of a calibration wafer. At least one controller is configured to determine a correction set for calibrating the lithographic apparatus based on the measured alignment of the at least one alignment mark type and apply first and second weight corrections to the correction set for processing the first and second lots, respectively, such that overlay drifts or jumps during processing the first and second lots are mitigated.

公开(公告)号：US20190227443A1

公开(公告)日：2019-07-25

申请号：US16313687

申请日：2017-06-26

Applicant: ASML Holding N.V.

Inventor： Eric Brian CATEY ,  Igor Matheus Petronell AARTS ,  Robert Anthony AUGELLI ,  Sergey MALYK

IPC: G03F7/20 ,  G03F9/00 ,  G01B11/25

Abstract: A method of applying a measurement correction includes calculating a first correction value based on a first coefficient and the measurement; calculating a second correction value based on a second coefficient, greater than the first coefficient, and the measurement; and calculating a third correction value based on a third coefficient, greater than the second coefficient, and the measurement. The method also includes applying the third correction value to the measurement if a difference between the first correction value and the third correction value is above a first threshold value; applying the second correction value to the measurement if a difference between the first correction value and the second correction value is above a second threshold value; and applying the first correction value to the measurement if the difference between the first correction value and the second correction value is below or equal to the second threshold value.