公开(公告)号：US11048175B2

公开(公告)日：2021-06-29

申请号：US16642927

申请日：2018-07-31

Applicant: ASML Holding N.V.

Inventor： Victor Antonio Perez-Falcon ,  Michael Andrew Chieda

IPC: G03F7/20

Abstract: Methods and systems are described for cleaning a support such as a clamp of a chuck that holds a patterning device or a wafer in a lithographic apparatus. The method includes loading a electrostatic cleaning substrate into a lithographic apparatus. The electrostatic cleaning substrate includes at least one electrode. The method further includes bringing the electrostatic cleaning substrate near to the clamping surface to be cleaned and connecting the electrode to a voltage source. Particles present on the support are then transferred to the electrostatic cleaning substrate.

公开(公告)号：US11500298B2

公开(公告)日：2022-11-15

申请号：US17415715

申请日：2019-12-12

Applicant: ASML Holding N.V.

Inventor： Eric Justin Monkman ,  Michael Andrew Chieda ,  Stephen Roux ,  Victor Antonio Perez-Falcon

IPC: G03F7/20

Abstract: An apparatus for reticle sub-field thermal control in a lithography system is disclosed. The apparatus includes a clamp configured to fix an object. The clamp includes a plurality of gas distribution features that are spatially arranged in a pattern. The apparatus further includes a gas pressure controller configured to individually control a gas flow rate through each of the plurality of gas distribution features to spatially modulate a gas pressure distribution in a space between the clamp and the object. The gas distribution features include a plurality of trenches or holes arranged in an array form.

公开(公告)号：USRE49066E1

公开(公告)日：2022-05-10

申请号：US16804549

申请日：2020-02-28

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Adrianus Hendrik Koevoets ,  Michael Leo Nelson ,  Jacobus Cornelis Gerardus Van Der Sanden ,  Geoffrey O'Connor ,  Michael Andrew Chieda ,  Tammo Uitterdijk

IPC: G03F7/20 ,  H01L21/683 ,  H01L21/67

Abstract: A lithographic apparatus includes a clamp (406) configured to receive an object (402). The clamp defines at least one channel (408) configured to pass a fluid at a first fluid temperature. The lithographic apparatus also includes a chuck (404) coupled to the clamp. The chuck (404) defines at least one void (464) configured to thermally insulate the chuck from the clamp.

公开(公告)号：US10324383B2

公开(公告)日：2019-06-18

申请号：US15764594

申请日：2016-10-05

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Adrianus Hendrik Koevoets ,  Michael Leo Nelson ,  Jacobus Cornelius Gerardus Van Der Sanden ,  Geoffrey O'Connor ,  Michael Andrew Chieda ,  Tammo Uitterdijk

IPC: G03F7/20 ,  H01L21/683 ,  H01L21/67

Abstract: A lithographic apparatus includes a clamp (406) configured to receive an object (402). The clamp defines at least one channel (408) configured to pass a fluid at a first fluid temperature. The lithographic apparatus also includes a chuck (404) coupled to the clamp. The chuck (404) defines at least one void (464) configured to thermally insulate the chuck from the clamp.

公开(公告)号：US20150212425A1

公开(公告)日：2015-07-30

申请号：US14430021

申请日：2013-08-27

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Michael Andrew Chieda ,  Stephen Roux ,  Teun Peterus Adrianus De Wilt ,  Igor Matheus Petronella Aarts

IPC: G03F7/20 ,  G01B11/25 ,  G01D5/347

CPC classification number: G03F7/70191 ,  G01B11/2513 ,  G01D5/347 ,  G03F7/70716 ,  G03F7/70783 ,  G03F7/7085

Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support constructed to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further includes an encoder head designed to scan over a surface of the patterning device to determine a distortion in a first direction along a length of the patterning device and a distortion in a second direction substantially perpendicular to the surface of the patterning device.

Abstract translation: 光刻设备包括配置成调节辐射束的照明系统，构造成保持图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束，衬底 被构造成保持衬底的工作台以及配置成将图案化的辐射束投影到衬底的目标部分上的投影系统。 光刻设备还包括编码器头，其设计成在图案形成装置的表面上扫描以确定沿着图案形成装置的长度的第一方向的变形和基本上垂直于图案形成装置的表面的第二方向的变形。