公开(公告)号：US20040114119A1

公开(公告)日：2004-06-17

申请号：US10670801

申请日：2003-09-26

Applicant: ASML Netherlands B.V.

Inventor： Hans Van Der Laan ,  Johannes Jacobus Matheus Baselmans ,  Antonius Johannes Josephus Van Dijsseldonk ,  Martinus Hendrikus Antonius Leenders ,  Johannes Hubertus Josephina Moors

IPC: G03B027/54

CPC classification number: G03F7/706

Abstract: A measurement system configured to measure wave front aberrations of a projection system, as well as a lithographic apparatus including such a measurement system, is provided wherein the measurement system includes a diffractive element and structure configured to increase the pupil filling of the radiation in the pupil of the projection system, both movable into the projection beam between a radiation system and the projection system, and a sensor module configured to sense radiation that has traversed the projection system to measure wave front aberrations of the projection system.

Abstract translation: 提供了一种被配置为测量投影系统的波前像差的测量系统以及包括这种测量系统的光刻设备，其中测量系统包括衍射元件和结构，其被配置为增加瞳孔中的瞳孔填充 所述投影系统可移动到辐射系统和投影系统之间的投影光束中;以及传感器模块，被配置为感测已经穿过投影系统的辐射以测量投影系统的波前像差。

公开(公告)号：US20040114132A1

公开(公告)日：2004-06-17

申请号：US10696742

申请日：2003-10-30

Applicant: ASML NETHERLANDS B.V,

Inventor： Arie Jeffrey Den Boef ,  Hans Van Der Laan ,  Antonius Johannes Josephus Van Dijsseldonk ,  Mircea Dusa ,  Antoine Gaston Marie Kiers

IPC: G01B009/00

CPC classification number: G03F7/706

Abstract: In a method according to one embodiment of the invention, aberrations in a lithographic apparatus are detected by printing a test pattern having at least one degree of symmetry and being sensitive to a particular aberration in the apparatus, and using a scatterometer to derive information concerning the aberration. The test structure may comprise a two-bar grating, in which case the inner and outer duty ratios can be reconstructed to derive information indicative of comatic aberration. Alternatively, a hexagonal array of dots can be used, such that scatterometry data can be used to reconstruct dot diameters indicative of 3-wave aberration.

Abstract translation: 在根据本发明的一个实施例的方法中，通过印刷具有至少一个对称度并对装置中的特定像差敏感的测试图案来检测光刻设备中的像差，并且使用散射仪来得到关于 像差 测试结构可以包括双杆格栅，在这种情况下，可以重建内部和外部占空比以导出指示彗形像差的信息。 或者，可以使用六边形点阵列，使得散射测量数据可以用于重建指示3波像差的点直径。

公开(公告)号：US20040013226A1

公开(公告)日：2004-01-22

申请号：US10396693

申请日：2003-03-26

Applicant: ASML NETHERLANDS, B.V.

Inventor： Levinus Pieter Bakker ,  Jeroen Jonkers ,  Antonius Johannes Josephus Van Dijsseldonk ,  Marcel Mathijs Theodore Marie Dierichs

IPC: G21K005/00

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70041 ,  G03F7/70166 ,  G03F7/7055 ,  G21K1/04 ,  G21K1/043 ,  H05G2/00

Abstract: A controlled aperture provides an opening through a barrier separating two parts of the apparatus to enable a pulse of radiation to be radiated from one part of the apparatus to the a second part. The controlled aperture closes the opening between the pulses of radiation to minimize the gas flow between the first and second parts.

Abstract translation: 受控孔径通过隔离装置的两部分的屏障提供开口，以使辐射脉冲从装置的一部分辐射到第二部分。 受控孔径封闭辐射脉冲之间的开口，以最小化第一和第二部分之间的气体流动。

公开(公告)号：US20030180632A1

公开(公告)日：2003-09-25

申请号：US10379999

申请日：2003-03-06

Applicant: ASML NETHERLANDS, B.V.

Inventor： Markus Franciscus Antonius Eurlings ,  Antonius Johannes Josephus Van Dijsseldonk ,  Marcel Mathijs Theodore Marie Dierichs

IPC: G03F001/00 ,  G03F007/20 ,  G03F007/213

CPC classification number: B82Y40/00 ,  B82Y10/00 ,  G03F1/24 ,  G03F7/70283

Abstract: A reflective mask has a sub-resolution texture applied to absorbing areas to reduce the amount of power in the specular reflection. The texture may form a phase contrast grating or may be a diffuser. The same technique may be applied to the other absorbers in a lithographic apparatus.

Abstract translation: 反射掩模具有应用于吸收区域的亚分辨率纹理以减少镜面反射中的光焦度。 纹理可以形成相差光栅，或者可以是扩散器。 相同的技术可以应用于光刻设备中的其它吸收体。