公开(公告)号：US20040109151A1

公开(公告)日：2004-06-10

申请号：US10639753

申请日：2003-08-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Levinus Pieter Bakker ,  Jeroen Jonkers ,  Frank Jeroen Pieter Schuurmans ,  Hugo Matthieu Visser

IPC: G03B027/72

CPC classification number: B82Y10/00 ,  G02B17/004 ,  G02B17/006 ,  G02B27/0043 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70891 ,  G03F7/70916

Abstract: A lithographic projection apparatus includes a radiation system configured to form a projection beam of radiation from radiation emitted by a radiation source, as well as a support configured to hold a patterning device, which when irradiated by the projection beam provides the projection beam with a pattern. A substrate table is configured to hold a substrate, and a projection system is configured to image an irradiated portion of the patterning device onto a target portion of the substrate. The radiation system further includes an aperture at a distance from the optical axis, a reflector which is placed behind the aperture when seen from the source and a structure placed in a low radiation intensive region behind the aperture.

Abstract translation: 光刻投影设备包括辐射系统，该辐射系统被配置为从由辐射源发射的辐射形成辐射的投射光束，以及被配置为保持图案形成装置的支撑件，当图案形成装置被投影光束照射时，投影光束提供图案 。 衬底台被配置为保持衬底，并且投影系统被配置为将图案形成装置的照射部分成像到衬底的目标部分上。 辐射系统还包括距离光轴一定距离处的孔，当从源观察时，放置在孔后面的反射器和放置在孔后面的低辐射密集区域中的结构。

公开(公告)号：US20030142280A1

公开(公告)日：2003-07-31

申请号：US10328174

申请日：2002-12-26

Applicant: ASML NETHERLANDS, B.V.

Inventor： Leon Bakker ,  Jeroen Jonkers ,  Hugo Matthieu Visser

IPC: G03B027/42

CPC classification number: B82Y10/00 ,  G03F7/70033 ,  G03F7/70908

Abstract: A lithographic apparatus includes a first space containing a plasma source and also containing a source gas which may have a high absorption of radiation at the wavelength of the projection beam of the apparatus, this gas being restricted from entering the remainder of the lithographic system by a second space containing a buffer gas having a low absorption at the wavelength of the projection beam of the apparatus. The pressure of the buffer gas is lower than or equal to that of the source gas.

Abstract translation: 光刻设备包括含有等离子体源的第一空间，并且还包含可在设备的投影光束的波长处具有高吸收辐射的源气体，该气体被限制为通过以下方式进入光刻系统的其余部分： 第二空间包含在设备的投影光束的波长处具有低吸收的缓冲气体。 缓冲气体的压力低于或等于源气体的压力。

公开(公告)号：US20040165160A1

公开(公告)日：2004-08-26

申请号：US10733771

申请日：2003-12-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Michael Cornelis Van Beek ,  Levinus Pieter Bakker ,  Theodorus Hubertus Josephus Bisschops ,  Jeroen Jonkers ,  Mark Kroon ,  Robertus Adrianus Maria Wolters ,  Adrianus Johannes Henricus Maas

IPC: G03B027/52

CPC classification number: G03F7/70925 ,  B08B7/0057

Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a support structure constructed to support a patterning structure. The patterning structure is adapted to pattern a beam of radiation according to a desired pattern. The apparatus also includes a substrate holder that is constructed to hold a substrate, a projection system that is constructed and arranged to project the patterned beam onto a target portion of the substrate, and a downstream radical source that is connected to a gas supply and is configured to provide a beam of radicals onto a surface to be cleaned.

Abstract translation: 公开了一种光刻投影装置。 该装置包括构造成支撑图形结构的支撑结构。 图形结构适于根据期望的图案对辐射束进行图案化。 该装置还包括被构造成保持基板的基板保持器，被构造和布置成将图案化的光束投影到基板的目标部分上的投影系统，以及连接到气体源的下游自由基源，并且是 被配置为在待清洁的表面上提供自由基束。

公开(公告)号：US20040013226A1

公开(公告)日：2004-01-22

申请号：US10396693

申请日：2003-03-26

Applicant: ASML NETHERLANDS, B.V.

Inventor： Levinus Pieter Bakker ,  Jeroen Jonkers ,  Antonius Johannes Josephus Van Dijsseldonk ,  Marcel Mathijs Theodore Marie Dierichs

IPC: G21K005/00

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70041 ,  G03F7/70166 ,  G03F7/7055 ,  G21K1/04 ,  G21K1/043 ,  H05G2/00

Abstract: A controlled aperture provides an opening through a barrier separating two parts of the apparatus to enable a pulse of radiation to be radiated from one part of the apparatus to the a second part. The controlled aperture closes the opening between the pulses of radiation to minimize the gas flow between the first and second parts.

Abstract translation: 受控孔径通过隔离装置的两部分的屏障提供开口，以使辐射脉冲从装置的一部分辐射到第二部分。 受控孔径封闭辐射脉冲之间的开口，以最小化第一和第二部分之间的气体流动。