公开(公告)号：US20160231654A1

公开(公告)日：2016-08-11

申请号：US15023330

申请日：2014-09-11

Applicant: ASML NETHERLANDS B. V.

Inventor： Duan-Fu Stephen HSU ,  Rafael C. HOWELL ,  Feng-Liang LIU

IPC: G03F7/20

CPC classification number: G03F7/70483 ,  G03F7/70125 ,  G03F7/70433 ,  G03F7/705

Abstract: A method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus having an illuminator and projection optics, the method including: computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, at least some of the design variables being characteristics of the illumination produced by the illuminator and of the design layout, wherein the multi-variable cost function is a function of a three-dimensional resist profile on the substrate, or a three-dimensional radiation field projected from the projection optics, or both; and reconfiguring one or more characteristics of the lithographic process by adjusting the design variables until a predefined termination condition is satisfied.

Abstract translation: 一种改进用于使用具有照明器和投影光学器件的光刻投影装置将设计布局的一部分成像到衬底上的光刻工艺的方法，所述方法包括：计算作为特征的多个设计变量的多变量成本函数 至少一些设计变量是由照明器产生的照明和设计布局的特征，其中多变量成本函数是衬底上的三维抗蚀剂轮廓的函数，或 从投影光学器件投射的三维辐射场，或两者; 以及通过调整设计变量来重新配置光刻处理的一个或多个特性，直到满足预定的终止条件。