公开(公告)号：US20200233310A1

公开(公告)日：2020-07-23

申请号：US16838139

申请日：2020-04-02

Applicant: ASML NETHERLANDS B. V.

Inventor： Léon Maria Albertus VAN DER LOGT ,  Bart Peter Bert SEGERS ,  Simon Hendrik Celine VAN GORP ,  Carlos Cornelis Maria LUIJTEN ,  Frank STAALS

IPC: G03F7/20

Abstract: A lithographic process is one that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. During the lithographic process, the focus needs to be controlled. There is disclosed a method for determining a fingerprint of a performance parameter associated with a substrate, such as a focus value to be used during the lithographic process. A reference fingerprint of the performance parameter is determined for a reference substrate. A reference substrate parameter of the reference substrate is determined. A substrate parameter for a substrate, such as a substrate with product structures, is determined. Subsequently, the fingerprint of the performance parameter is determined based on the reference fingerprint, reference substrate parameter and the substrate parameter. The fingerprint may then be used to control the lithographic process.

公开(公告)号：US20240412067A1

公开(公告)日：2024-12-12

申请号：US18808844

申请日：2024-08-19

Applicant: ASML Netherlands B. V.

Inventor： Lorenzo TRIPODI ,  Patrick WARNAAR ,  Grzegorz GRZELA ,  Mohammadreza HAJIAHMADI ,  Farzad FARHADZADEH ,  Patricius Aloysius Jacobus TINNEMANS ,  Scott Anderson MIDDLEBROOKS ,  Adrianus Cornelis Matheus KOOPMAN ,  Frank STAALS ,  Brennan PETERSON ,  Anton Bernhard VAN OOSTEN

IPC: G06N3/08 ,  G01B11/02 ,  G01N21/55 ,  G06T7/00

Abstract: Disclosed is a method of determining a characteristic of interest relating to a structure on a substrate formed by a lithographic process, the method comprising: obtaining an input image of the structure; and using a trained neural network to determine the characteristic of interest from said input image. Also disclosed is a reticle comprising a target forming feature comprising more than two sub-features each having different sensitivities to a characteristic of interest when imaged onto a substrate to form a corresponding target structure on said substrate. Related methods and apparatuses are also described.