公开(公告)号：US20220373892A1

公开(公告)日：2022-11-24

申请号：US17882389

申请日：2022-08-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Yu CAO ,  Yen-Wen LU ,  : Peng LIU ,  Rafael C. HOWELL ,  Roshni BISWAS

IPC: G03F7/20

Abstract: A method including: obtaining a thin-mask transmission function of a patterning device and a M3D model for a lithographic process, wherein the thin-mask transmission function is a continuous transmission mask (CTM) and the M3D model at least represents a portion of M3D attributable to multiple edges of structures on the patterning device; determining a M3D mask transmission function of the patterning device by using the thin-mask transmission function and the M3D model; and determining an aerial image produced by the patterning device and the lithographic process, by using the M3D mask transmission function.