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1.发明申请公开(公告)号：US20180292762A1
公开(公告)日：2018-10-11
申请号：US16008355
申请日：2018-06-14
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas Rudolf KEMPER , Nicolaas TEN KATE , Joost Jeroen OTTENS , Marcel BECKERS , Marco POLIZZI , Michel RIEPEN , Anthonie KUIJPER , Koen STEFFENS , Adrianes Johannes BAETEN , Anca Mihaela ANTONEVICI
Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
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2.发明申请LITHOGRAPHIC APPARATUS, DRYING DEVICE, METROLOGY APPARATUS AND DEVICE MANUFACTURING METHOD 有权光刻装置，干燥装置，计量装置和装置制造方法公开(公告)号：US20150015857A1
公开(公告)日：2015-01-15
申请号：US14498883
申请日：2014-09-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas Rudolf KEMPER , Nicolaas TEN KATE , Joost Jeroen OTTENS , Marcel BECKERS , Marco POLIZZI , Michel RlEPEN , Anthonie KUIJPER , Koen STEFFENS , Adrianes Johannes BAETEN , Anca Mihaela ANTONEVICI
CPC classification number: G03F7/70866 , B01D19/0021 , G03B27/52 , G03F7/70341
Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
Abstract translation: 描述了一种浸没式光刻设备，其中通过使富液体流优先沿着表面流动，将两相流分离成富含液体的富气流。
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