公开(公告)号：US11294294B2

公开(公告)日：2022-04-05

申请号：US16966536

申请日：2019-02-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Richard Johannes Franciscus Van Haren ,  Leon Paul Van Dijk ,  Orion Jonathan Pierre Mouraille ,  Anne Marie Pastol

IPC: G03F7/20 ,  G03F9/00

Abstract: Methods and apparatuses for determining a position of an alignment mark applied to a region of a first layer on a substrate using a lithographic process by: obtaining an expected position of the alignment mark; obtaining a geometrical deformation of the region due to a control action correcting the lithographic process; obtaining a translation of the alignment mark due to the geometrical deformation; and determining the position of the alignment mark based on the expected position and the translation.