公开(公告)号：US20190086821A1

公开(公告)日：2019-03-21

申请号：US16195163

申请日：2018-11-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob STREEFKERK ,  Antonius Theodoras Anna Maria DERKSEN ,  Joeri LOF ,  Klaus SIMON ,  Alexander STRAAIJER

IPC: G03F7/20

Abstract: An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.