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公开(公告)号：US20190250518A1
公开(公告)日：2019-08-15
申请号：US16245400
申请日：2019-01-11
发明人： Joeri LOF , Hans BUTLER , Sjoerd Nicolaas Lambertus DONDERS , Aleksey Yurievich KOLESNYCHENKO , Erik Roelof LOOPSTRA , Hendricus Johannes Maria MEIJER , Johannes Catherinus Hubertus MULKENS , Roelof Aeilko Siebrand RITSEMA , Frank VAN SCHAIK , Timotheus Franciscus SENGERS , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Bob STREEFKERK , Erik Theodorus Maria BIJLAART , Christiaan Alexander HOOGENDAM , Helmar VAN SANTEN , Marcus Adrianus VAN DE KERKHOF , Mark KROON , Arie Jeffrey DEN BOEF , Joost Jeroen OTTENS , Jeroen Johannes Sophia Maria MERTENS
IPC分类号： G03F7/20
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
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公开(公告)号：US20190079414A1
公开(公告)日：2019-03-14
申请号：US16121735
申请日：2018-09-05
发明人： Alexander STRAAIJER
摘要： The present invention provides a method for determining overlay. The method comprises obtaining an initial overlay estimate relating to a first set of targets and data about a second set of targets, wherein the data for a target comprises an intensity measurement of the target for each of a group of different wavelengths. The method further comprises using the initial overlay estimate to filter data relating to the second set of targets and using the filtered data to estimate overlay on the substrate
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公开(公告)号：US20200225590A1
公开(公告)日：2020-07-16
申请号：US16707525
申请日：2019-12-09
发明人： Joeri LOF , Erik Theodorus Maria BIJLAART , Hans BUTLER , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Aleksey Yurievich KOLESNYCHENKO , Erik Roelof LOOPSTRA , Hendricus Johannes Maria MEIJER , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Roelof Aeilko Siebrand RITSEMA , Frank VAN SCHAIK , Timotheus Franciscus SENGERS , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Bob STREEFKERK , Helmar VAN SANTEN , Antonius Theodorus Anna Maria DERKSEN , Hans JANSEN , Jacobus Johannus Leonardus Hendricus VERSPAY
IPC分类号： G03F7/20
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
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公开(公告)号：US20180136570A1
公开(公告)日：2018-05-17
申请号：US15869661
申请日：2018-01-12
发明人： Si-Han ZENG , Yue-Lin PENG , Jen-Yu FANG , Arie Jeffrey DEN BOEF , Alexander STRAAIJER , Ching-Yi HUNG , Patrick WARNAAR
CPC分类号： G03F7/70633 , G01B11/24 , G01B11/272
摘要： Disclosed are a method, computer program and associated apparatuses for measuring a parameter of a lithographic process. The method comprising the steps of: obtaining first measurements comprising measurements of structural asymmetry relating to a plurality of first structures, each of said plurality of measurements of structural asymmetry corresponding to a different measurement combination of measurement radiation and a value for at least a first parameter; obtaining a plurality of second measurements of target asymmetry relating to a plurality of targets, each of said plurality of measurements of target asymmetry corresponding to one of said different measurement combinations, determining a relationship function describing the relationship between said first measurements and said second measurements, for each of said measurement combinations; determining, from said relationship function, a corrected overlay value, said corrected overlay value being corrected for structural contribution due to structural asymmetry in at least said first structure.
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公开(公告)号：US20180129143A1
公开(公告)日：2018-05-10
申请号：US15862604
申请日：2018-01-04
发明人： Christiaan Alexander HOOGENDAM , Antonius Theodorus Anna Maria DERKSEN , Sjoerd Nicolaas Lambertus DONDERS , Joeri LOF , Erik Roelof LOOPSTRA , Johannes Catharinus Hubertus MULKENS , Hans JANSEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Alexander STRAAIJER , Bob STREEFKERK
IPC分类号： G03F7/20
摘要： A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
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公开(公告)号：US20170102621A1
公开(公告)日：2017-04-13
申请号：US15385584
申请日：2016-12-20
发明人： Joeri LOF , Hans BUTLER , Sjoerd Nicolaas Lambertus DONDERS , Aleksey Yurievich KOLESNYCHENKO , Erik Roelof LOOPSTRA , Hendricus Johannes Maria MEIJER , Johannes Catherinus Hubertus MULKENS , Roelof Aeilko Siebranc RITSEMA , Frank VAN SCHAIK , Timotheus Franciscus SENGERS , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Bob STREEFKERK , Erik Theodorus Maria BIJLAART , Christiaan Alexander HOOGENDAM , Helmar VAN SANTEN , Marcus Adrianus VAN DE KERKHOF , Mark KROON , Arie Jeffrey DEN BOEF , Joost Jeroen OTTENS , Jeroen Johannes Sophia Maria MERTENS
IPC分类号： G03F7/20
CPC分类号： G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
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7.发明申请公开(公告)号：US20160313654A1
公开(公告)日：2016-10-27
申请号：US15133866
申请日：2016-04-20
发明人： Si-Han ZENG , Yue-Lin PENG , Jen-Yu FANG , Arie Jeffrey DEN BOEF , Alexander STRAAIJER , Ching-Yi HUNG , Patrick WARNAAR
CPC分类号： G03F7/70633 , G01B11/24 , G01B11/272
摘要： Disclosed are a method, computer program and associated apparatuses for measuring a parameter of a lithographic process. The method comprising the steps of: obtaining first measurements comprising measurements of structural asymmetry relating to a plurality of first structures, each of said plurality of measurements of structural asymmetry corresponding to a different measurement combination of measurement radiation and a value for at least a first parameter; obtaining a plurality of second measurements of target asymmetry relating to a plurality of targets, each of said plurality of measurements of target asymmetry corresponding to one of said different measurement combinations, determining a relationship function describing the relationship between said first measurements and said second measurements, for each of said measurement combinations; determining, from said relationship function, a corrected overlay value, said corrected overlay value being corrected for structural contribution due to structural asymmetry in at least said first structure.
摘要翻译： 公开了用于测量光刻工艺的参数的方法，计算机程序和相关联的装置。 该方法包括以下步骤：获得包括与多个第一结构相关的结构不对称性的测量的第一测量，所述多个测量结构不对称中的每一个对应于测量辐射的不同测量组合和至少第一参数的值 ; 获得与多个目标相关的目标不对称性的多个第二测量值，所述多个测量目标不对称中的每一个对应于所述不同测量组合之一，确定描述所述第一测量和所述第二测量之间的关系的关系函数， 对于每个所述测量组合; 根据所述关系函数确定校正重叠值，所述校正重叠值由于至少所述第一结构中的结构不对称而被校正为结构贡献。
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公开(公告)号：US20190302631A1
公开(公告)日：2019-10-03
申请号：US16382483
申请日：2019-04-12
发明人： Joeri LOF , Erik Theodorus Maria BIJLAART , Hans BUTLER , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Aleksey Yurievich KOLESNYCHENKO , Erik Roelof LOOPSTRA , Hendricus Johannes Maria MEIJER , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Roelof Aeilko Siebrand RITSEMA , Frank VAN SCHAIK , Timotheus Franciscus SENGERS , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Bob STREEFKERK , Helmar VAN SANTEN , Antonius Theodorus Anna Maria DERKSEN , Hans JANSEN , Jacobus Johannus Leonardus Hendricus VERSPAY
IPC分类号： G03F7/20
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
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公开(公告)号：US20190278190A1
公开(公告)日：2019-09-12
申请号：US16421697
申请日：2019-05-24
发明人： Scott Anderson MIDDLEBROOKS , Niels GEYPEN , Hendrik Jan Hidde SMILDE , Alexander STRAAIJER , Maurits VAN DER SCHAAR , Markus Gerardus Martinus Maria VAN KRAAIJ
IPC分类号： G03F7/20
摘要： Disclosed is a method of measuring a parameter of a lithographic process, and associated inspection apparatus. The method comprises measuring at least two target structures on a substrate using a plurality of different illumination conditions, the target structures having deliberate overlay biases; to obtain for each target structure an asymmetry measurement representing an overall asymmetry that includes contributions due to (i) the deliberate overlay biases, (ii) an overlay error during forming of the target structure and (iii) any feature asymmetry. A regression analysis is performed on the asymmetry measurement data by fitting a linear regression model to a planar representation of asymmetry measurements for one target structure against asymmetry measurements for another target structure, the linear regression model not necessarily being fitted through an origin of the planar representation. The overlay error can then be determined from a gradient described by the linear regression model.
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公开(公告)号：US20190212661A1
公开(公告)日：2019-07-11
申请号：US16229102
申请日：2018-12-21
发明人： Joeri LOF , Hans BUTLER , Sjoerd Nicolaas Lambertus DONDERS , Aleksey Yurievich KOLESNYCHENKO , Erik Roelof LOOPSTRA , Hendricus Johannes Maria MEIJER , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Roelof Aeilko Siebrand RITSEMA , Frank VAN SCHAIK , Timotheus Franciscus SENGERS , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Helmar VAN SANTEN
IPC分类号： G03F7/20
摘要： A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.
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