公开(公告)号：US20220365450A1

公开(公告)日：2022-11-17

申请号：US17623931

申请日：2020-06-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Arie VAN DEN BRINK ,  Simon Hendrik Celine VAN GORP

IPC: G03F7/20 ,  G03F9/00

Abstract: Apparatus and methods for determining a focus error for a lithographic apparatus and/or a difference between first and second metrology data. The first and/or second metrology data includes a plurality of values of a parameter relating to a substrate, the substrate including a plurality of fields including device topology. The apparatus may include a processor configured to execute computer program code to cause the processor to: determine an intra-field component of the parameter; remove the determined intra-field component from the first metrology data to obtain an inter-field component of the first metrology data; and determine the difference between the first metrology data and second metrology data based on the inter-field component and the second metrology data.