公开(公告)号：US10782616B2

公开(公告)日：2020-09-22

申请号：US16325767

申请日：2017-08-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Daimian Wang ,  Shengrui Zhang ,  Chi-Hsiang Fan

IPC: G06F30/33 ,  G03F7/20 ,  G03F9/00

Abstract: A method including performing a first simulation for each of a plurality of different metrology target measurement recipes using a first model, selecting a first group of metrology target measurement recipes from the plurality of metrology target measurement recipes, the first group of metrology target measurement recipes satisfying a first rule, performing a second simulation for each of the metrology target measurement recipes from the first group using a second model, and selecting a second group of metrology target measurement recipes from the first group, the second group of metrology target measurement recipes satisfying a second rule, the first model being less accurate or faster than the second model and/or the first rule being less restrictive than the second rule.

公开(公告)号：US10691029B2

公开(公告)日：2020-06-23

申请号：US16305913

申请日：2017-06-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Ning Gu ,  Daimian Wang ,  Jen-Shiang Wang

IPC: G03F7/00 ,  G06F30/30 ,  G03F7/20

Abstract: A method including computing a multi-variable cost function, the multi-variable cost function representing a metric characterizing a degree of matching between a result when measuring a metrology target structure using a substrate measurement recipe and a behavior of a pattern of a functional device, the metric being a function of a plurality of design variables including a parameter of the metrology target structure, and adjusting the design variables and computing the cost function with the adjusted design variables, until a certain termination condition is satisfied.