公开(公告)号：US20240248411A1

公开(公告)日：2024-07-25

申请号：US18555192

申请日：2022-03-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Cornelius Maria ROPS ,  Giovanni Luca GATTOBIGIO ,  Eric Henricus Egidius Catharina EUMMELEN ,  Dennis VAN DEN BERG

IPC: G03F7/00

CPC classification number: G03F7/70341 ,  G03F7/70808 ,  G03F7/70875

Abstract: A fluid handling system for a lithographic apparatus, the fluid handling system configured to confine immersion liquid to a liquid confinement space between a part of a projection system and a surface of a substrate in the lithographic apparatus wherein a radiation beam projected from the projection system can irradiate the surface of the substrate by passing through the immersion liquid, the fluid handling system including: a liquid extraction member, having an inlet side and an outlet side, that is arranged to extract the immersion liquid from the liquid confinement space by a fluid flow from the inlet side to the outlet side; and a further liquid supply to the outlet side of the liquid extraction member arranged so that the outlet side receives liquid from a different source than the liquid confinement space.