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公开(公告)号：US20240353764A1
公开(公告)日：2024-10-24
申请号：US18388298
申请日：2023-11-09
发明人： Kyung Chin YI , Dong Sik Jeong , Sun Ho Kim , Woo-Hyung Kim , Seung Uk Park , Yong Hee Lee
IPC分类号： G03F7/00
CPC分类号： G03F7/70916 , G03F7/70725 , G03F7/70808 , G03F7/7095 , G03F7/70991
摘要： Provided is a lithography apparatus including a wafer stage, a cable connected to the wafer stage, the cable being configured to bend based on the wafer stage moving, a support unit configured to prevent the cable from sagging, the support unit including a plurality of clamps configured to restrict movement of the cable and a connection member connecting the plurality of clamps to each other, and a protective unit under the cable, the protective unit being configured to collide with the support unit based on the wafer stage moving, wherein the protective unit includes ultra-high molecular weight polyethylene (UHMWPE).
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公开(公告)号：US11914308B2
公开(公告)日：2024-02-27
申请号：US18123620
申请日：2023-03-20
CPC分类号： G03F7/7085 , G03F7/70716 , G03F7/70725 , G03F7/70775 , G03F7/70808 , G03F9/70 , G03F9/7015 , G03F9/7019 , G03F9/7049 , G03F9/7084 , G03F9/7088 , G03F7/70633
摘要： A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
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公开(公告)号：US20230341762A1
公开(公告)日：2023-10-26
申请号：US18303077
申请日：2023-04-19
发明人： KEIJI MATSUMOTO , KAZUHIRO ASAI
CPC分类号： G03F1/60 , G03F1/48 , G03F7/001 , G03F7/0382 , G03F7/70358 , G03F7/70675 , G03F7/70808
摘要： A print element substrate including a substrate having an energy generating element that generates energy for ejecting liquid from an ejection port and a flow passage forming member including a flow passage that supplies the liquid to the ejection port, wherein the flow passage forming member includes a cavity not communicating with the flow passage, and a side surface of the cavity is formed substantially perpendicular to the substrate wherein a base film is formed between the cavity and the substrate. The refractive index of the flow passage forming member is lower than the refractive index of the base film, and the difference between the refractive index of the flow passage forming member and the refractive index of the base film is greater than or equal to 0.3.
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公开(公告)号：US11782350B2
公开(公告)日：2023-10-10
申请号：US17884472
申请日：2022-08-09
发明人： Shao-Hua Wang , Chueh-Chi Kuo , Kuei-Lin Ho , Zong-You Yang , Cheng-Wei Sun , Wei-Yuan Chen , Cheng-Chieh Chen , Heng-Hsin Liu , Li-Jui Chen
CPC分类号： G03F7/70716 , G03F7/70808
摘要： A lithography system includes a table body, a wafer stage, a first sliding member, a second sliding member, a first cable, a first bracket, a rail guide, and a first protective film. The first sliding member is coupled to the wafer stage. The second sliding member is coupled to an edge of the table body, in which the first sliding member is coupled to a track of the second sliding member. The first bracket fixes the first cable, the first bracket being coupled to a roller structure, in which the roller structure includes a body and a wheel coupled to the body. The rail guide confines a movement of the wheel of the roller structure. The first protective film is adhered to a surface of the rail guide, in which the roller structure is moveable along the first protective film on the surface of the rail guide.
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公开(公告)号：US20230273534A1
公开(公告)日：2023-08-31
申请号：US18311795
申请日：2023-05-03
发明人： Chieh HSIEH , Tai-Yu CHEN , Cho-Ying LIN , Heng-Hsin LIU , Li-Jui CHEN , Shang-Chieh CHIEN
CPC分类号： G03F7/70925 , G03F7/70033 , G02B17/0663 , G03F7/70491 , H05G2/008 , G03F7/70808
摘要： A lithography system is provided capable of deterring contaminants, such as tin debris from entering into the scanner. The lithography system in accordance with various embodiments of the present disclosure includes a processor, an extreme ultraviolet light source, a scanner, and a hollow connection member. The light source includes a droplet generator for generating a droplet, a collector for reflecting extreme ultraviolet light into an intermediate focus point, and a light generator for generating pre-pulse light and main pulse light. The droplet generates the extreme ultraviolet light in response to the droplet being illuminated with the pre-pulse light and the main pulse light. The scanner includes a wafer stage. The hollow connection member includes an inlet that is in fluid communication with an exhaust pump. The hollow connection member provides a hollow space in which the intermediate focus point is disposed. The hollow connection member is disposed between the extreme ultraviolet light source and the scanner.
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公开(公告)号：US11740565B2
公开(公告)日：2023-08-29
申请号：US17784951
申请日：2020-12-09
发明人： Taylor John Hartung , Yue Ma , Marc Guy Langlois , Jeremy Burke , Esteban Joseph Sandoval Johnson
CPC分类号： G03F7/70916 , G03F7/70033 , G03F7/7085 , G03F7/70808
摘要： Systems, apparatuses, and methods are provided for a collector flow ring (CFR) housing configured to mitigate an accumulation of fuel debris in an extreme ultraviolet (EUV) radiation system. An example CFR housing can include a plurality of showerhead flow channel outlets configured to output a plurality of first gaseous fluid flows over a plurality of portions of a plasma-facing surface of the CFR housing. The example CFR housing can further include a gutter purge flow channel outlet configured to output a second gaseous fluid flow over a fuel debris-receiving surface of the CFR housing. The example CFR housing can further include a shroud mounting structure configured to support a shroud assembly, a cooling flow channel configured to transport a fluid, and a plurality of optical metrology ports configured to receive a plurality of optical metrology tubes.
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公开(公告)号：US20230213851A1
公开(公告)日：2023-07-06
申请号：US18120886
申请日：2023-03-13
CPC分类号： G03F7/70983 , G03F7/70958 , G03F1/62 , G03F7/70808
摘要： A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack having a planar substrate and at least one membrane layer, wherein the planar substrate includes an inner region and a border region around the inner region; and selectively removing the inner region of the planar substrate. The membrane assembly includes: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate. The stack is provided with a mechanical protection material configured to mechanically protect the border region during the selectively removing the inner region of the planar substrate.
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公开(公告)号：US11662667B2
公开(公告)日：2023-05-30
申请号：US17439566
申请日：2021-06-17
发明人： Bo Liu
IPC分类号： G03F7/20
CPC分类号： G03F7/70725 , G03F7/7085 , G03F7/70733 , G03F7/70758 , G03F7/70808
摘要： The present application provides an exposure machine, relates to semiconductor integrated circuit manufacturing technologies. The exposure machine includes a machine platform, a shielding device, and a drive device; the machine platform is provided with a recess portion, the recess portion has a top opening, a base and a placement table are disposed in the recess portion, the placement table is configured to carry a mask carrier, and the mask carrier can be placed on the placement table through the top opening; and the machine platform is further provided with a drive device and a movable shielding device, when the shielding device is at an initial position, the shielding device covers the top opening, and when the mask carrier needs to be placed on the placement table through the top opening, the drive device opens the shielding device to expose the top opening.
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公开(公告)号：US20190187566A1
公开(公告)日：2019-06-20
申请号：US16099733
申请日：2017-04-20
IPC分类号： G03F7/20
CPC分类号： G03F7/7085 , G03F7/70633 , G03F7/70716 , G03F7/70725 , G03F7/70775 , G03F7/70808 , G03F9/70 , G03F9/7015 , G03F9/7019 , G03F9/7049 , G03F9/7084 , G03F9/7088
摘要： A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
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公开(公告)号：US10073360B2
公开(公告)日：2018-09-11
申请号：US15541636
申请日：2015-01-28
发明人： Naoyuki Takeda , Shoichi Kuga
CPC分类号： G03F7/70825 , G03F7/2028 , G03F7/7015 , G03F7/70266 , G03F7/70308 , G03F7/70433 , G03F7/708 , G03F7/70808 , H01L21/67259
摘要： An edge exposure apparatus for exposure of an outer circumferential portion of a semiconductor substrate to light includes a light source provided to be able to emit light to the outer circumferential portion and a mirror having a reflection surface arranged to extend in a direction intersecting with an optical axis of light emitted from the light source. The mirror is provided between the outer circumferential portion and a center of the semiconductor substrate in a radial direction of the semiconductor substrate in exposure of the outer circumferential portion of the semiconductor substrate to light.
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