公开(公告)号：US11796920B2

公开(公告)日：2023-10-24

申请号：US17797506

申请日：2021-01-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Jochem Sebastiaan Wildenberg ,  Hermanus Adrianus Dillen ,  Fan Feng ,  Ronald Van Ittersum ,  Willem Louis Van Mierlo ,  Koen Thuijs

IPC: G03F7/20 ,  G03F7/00

CPC classification number: G03F7/70525

Abstract: A method and associated apparatuses for controlling a process of manufacturing semiconductor devices on a substrate. The method includes obtaining process data relating to the process and determining a correction for the process based on the process data and a first control objective associated with the devices on the substrate. A first probability of the first control objective being achievable is determined and the correction adjusted based on the probability and at least a second control objective having a second probability of being achievable compared to the first control objective.