公开(公告)号：US20230288815A1

公开(公告)日：2023-09-14

申请号：US18019968

申请日：2021-07-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Siebe Tjerk DE ZWART ,  Remco DIRKS ,  Gaurav NANDA ,  Bastiaan Onne FAGGINGER AUER

IPC: G03F7/20 ,  G03F7/00

CPC classification number: G03F7/70525 ,  G03F7/70504 ,  G03F7/706839 ,  G03F7/706845

Abstract: Methods and systems for determining a mapped intensity metric are described. Determining the mapped intensity metric includes determining an intensity metric for a manufacturing system. The intensity metric is determined based on a reflectivity of a location on a substrate and a manufacturing system characteristic. Determining the mapped intensity metric also includes determining a mapped intensity metric for a reference system. The reference system has a reference system characteristic. The mapped intensity metric is determined based on the intensity metric, the manufacturing system characteristic, and the reference system characteristic, to mimic determination of the intensity metric for the manufacturing system using the reference system. In some embodiments, the reference system is virtual, and the manufacturing system is physical.