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公开(公告)号：US12092966B2
公开(公告)日：2024-09-17
申请号：US18386846
申请日：2023-11-03
Applicant: KLA Corporation
Inventor： Amnon Manassen , Nadav Gutman , Frank Laske , Andrei V. Shchegrov
CPC classification number: G03F7/706845 , G01B11/272 , G01B15/00 , G03F7/70655 , G01B2210/56
Abstract: A system and method are disclosed for generating metrology measurements with second sub-system such as an optical sub-system. The method may include performing a training and a run-time operation. The training may include receiving first metrology data for device features from the first metrology sub-system (e.g., optical); generating first metrology measurements (e.g., critical dimensions, etc.); binning the device features into two or more device bins based on the first metrology measurements; and identifying representative metrology targets for the two or more device bins based on distributions of the first metrology measurements. The run-time operation may include receiving run-time metrology data (e.g., optical) of the representative metrology targets; and generating run-time metrology measurements based on the run-time metrology data.
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2.发明公开公开(公告)号：US20230408933A1
公开(公告)日：2023-12-21
申请号：US18037641
申请日：2021-10-25
Applicant: ASML Netherlands B.V.
Inventor： Maarten Jozef JANSEN
IPC: G03F7/00 , G01B9/02001
CPC classification number: G03F7/706845 , G01B9/02007
Abstract: The invention provides a positioning system to determine an absolute position of a moveable target relative to a reference, comprising an interferometer system with a first light source to emit light at a fixed frequency and a second light source to emit light at at least two different frequencies. The positioning system is configured to determine, based on movement of the target, a phase difference curve associated with a first frequency of the second light source and a phase difference curve associated with a second frequency of the second light source as a function of a phase difference associated with the fixed frequency of the first light source and to determine a cross-point to determine the absolute position of the moveable target. The invention also relates to a lithographic apparatus and corresponding method.
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公开(公告)号：US20230341786A1
公开(公告)日：2023-10-26
申请号：US18296418
申请日：2023-04-06
Applicant: CANON KABUSHIKI KAISHA
Inventor： HIRONOBU FUJISHIMA , WATARU YAMAGUCHI
CPC classification number: G03F7/706845 , G06T7/80 , H04N17/002 , G03F7/70725 , G03F9/7019 , G03F9/7088 , G03F7/706849 , G06T2207/30204 , H04N23/56
Abstract: A calibration method of a detection system including an illumination system configured to illuminate a detection target, and an imaging system configured to form an image of light from the detection target on a photoelectric conversion element, the method including obtaining, for each of at least two combinations of first apertures in the illumination system and second apertures in the imaging system, each of which is formed by selecting one first aperture and one second aperture from the plurality of first apertures and the plurality of second apertures, a defocus characteristic indicating a shift amount of the image on the photoelectric conversion element with respect to a defocus amount of the detection target in a state in which each of the first aperture and the second aperture is positioned in a first position shifted from a reference position.
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公开(公告)号：US20240198533A1
公开(公告)日：2024-06-20
申请号：US18532074
申请日：2023-12-07
Applicant: Carl Zeiss SMT GmbH
Inventor： Johann Irnstetter , Thomas Gebhard , Marcel Vogt , Andreas Daubenschüz , Manuel Best
CPC classification number: B25J9/1692 , G03F7/70625 , G03F7/706845
Abstract: An interchangeable-object holding apparatus for an EUV metrology system serves for holding and providing an interchangeable object, which is intended to be used interchangeably within the EUV metrology system. An interchangeable-object holder is drivably displaceable via at least one holding drive. A calibration device serves for calibrating a relative position of the interchangeable object in the interchangeable-object holder with respect to a calibration object of the interchangeable-object holding apparatus. The calibration device has a plurality of holder abutment bodies, secured to the interchangeable-object holder, and a plurality of calibration-object counter-abutment bodies, secured to the calibration object. At least one contact sensor of the calibration device serves for detecting a contact between the respective holder abutment body and the respective calibration-object counter-abutment body. An evaluation unit is in signal communication with the holder drive and the contact sensor. The evaluation unit serves for determining the relative position of the interchangeable object in the interchangeable-object holder with respect to the calibration object from captured position and measurement data of the holder drive and of the contact sensor. The result is an interchangeable-object holding apparatus with which the interchangeable-object holder can be positioned relative to the calibration object with a specified level of accuracy and with less metrological complexity of the calibration device compared with the prior art.
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5.发明公开公开(公告)号：US20240184220A1
公开(公告)日：2024-06-06
申请号：US18510706
申请日：2023-11-16
Applicant: Gigaphoton Inc.
Inventor： Yuichi NISHIMURA , Yoshifumi UENO , Kotaro MIYASHITA
CPC classification number: G03F7/706845 , G03F7/70033 , G03F7/70041 , G03F7/70233 , G03F7/70258 , G03F7/7065 , G03F7/706847 , G03F7/706849 , H05G2/008
Abstract: An extreme ultraviolet light generation system includes a chamber including a first region; a target supply unit supplying a target to the first region; a laser device outputting pulse laser light; an optical system including an optical element to guide the pulse laser light to the first region; an irradiation position adjustment mechanism adjusting a laser irradiation position; an EUV light concentrating mirror arranged such that the pulse laser light passes outside the EUV light concentrating mirror and is guided to the first region; a plurality of EUV sensors measuring radiation energies of the EUV light radiated from the first region in mutually different radiation directions, and having a geometric centroid located at a position away from the optical axis in a direction toward the EUV light concentrating mirror; and a processor controlling the irradiation position adjustment mechanism as setting a target irradiation position of the pulse laser light.
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Patent Agency Ranking
公开(公告)号：US20230400782A1
公开(公告)日：2023-12-14
申请号：US18033530
申请日：2021-10-14
Applicant: ASML Holding N.V.
Inventor： Douglas C. CAPPELLI
IPC: G03F7/00
CPC classification number: G03F7/706849 , G03F7/706845 , G03F7/706847
Abstract: An inspection system, a lithographic apparatus, and a method are provided. The inspection system includes an illumination system, an optical system, a shutter system, an objective system and a detector. The illumination system is configured to generate an illumination beam. The optical system is configured to split the illumination beam into a first sub-beam and a second sub-beam. The shutter system is configured to independently control a transmittance of the first sub-beam and the second subbeam. The objective system is configured to receive the first sub-beam and the second beam from the optical system and direct the first sub-beam and the second sub-beam towards a substrate having a target structure. The detector is configured to receive an image or a diffracted image of the target structure.
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7.发明公开公开(公告)号：US20230273531A1
公开(公告)日：2023-08-31
申请号：US18016225
申请日：2021-06-29
Applicant: ASML Holding N.V.
Inventor： Mohamed SWILLAM , Justin Lloyd KREUZER , Stephen ROUX
CPC classification number: G03F7/706845 , G03F7/706849 , G03F7/706851 , G03F7/70233
Abstract: A metrology system comprises a radiation source, an optical element, first and second detectors, an integrated optical device comprising a multimode waveguide, and a processor. The radiation source generates radiation. The optical element directs radiation toward a target to generate scattered radiation from the target. The first detector receives a first portion of the scattered radiation and generates a first detection signal based on the received first portion. The multimode waveguide interferes a second portion of the scattered radiation using modes of the multimode waveguide. The second detector receives the interfered second portion and generates a second detection signal based on the received interfered second portion. The processor receives the first and second detection signals. The processor analyzes the received first portion, the received interfered second portion, and a propagation property of the multimode waveguide. The processor determines the property of the target based on the analysis.
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公开(公告)号：US20240295829A1
公开(公告)日：2024-09-05
申请号：US18574554
申请日：2023-05-24
Applicant: Onto Innovation Inc.
Inventor： Xin Song
IPC: G03F7/00
CPC classification number: G03F7/706841 , G03F7/70608 , G03F7/706845
Abstract: Proactive management of semiconductor substrate tools. A machine learning model is used to predict future performance characteristics for such tools. In some examples, the model can diagnose issues with tools or with ambient conditions of the tools' environment. In some examples, the model can recommend one or more remedial actions to maintain adequate performance of the substrate tool.
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公开(公告)号：US20240203796A1
公开(公告)日：2024-06-20
申请号：US18508566
申请日：2023-11-14
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Byeong Seon PARK , Sang-Ho Yun , Woo Jin Jung
IPC: H01L21/66 , G03F1/42 , G03F7/00 , G03F9/00 , H01L21/027
CPC classification number: H01L22/12 , G03F1/42 , G03F7/70633 , G03F7/706845 , G03F9/7065 , H01L21/027
Abstract: A method for manufacturing a semiconductor device, the method including forming a stack on a wafer, wherein the stack includes a plurality of layers of the stack, forming a photoresist pattern on the stack, determining whether a material of at least one layer among the plurality of layers of the stack has changed and whether at least one process among a plurality of processes for forming the plurality of layers of the stack has changed, changing a first wavelength for overlay measurement upon determination that the material of the at least one layer or the at least one process has changed, and measuring an overlay using the changed first wavelength for overlay measurement.
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公开(公告)号：US20240126182A1
公开(公告)日：2024-04-18
申请号：US18483918
申请日：2023-10-10
Applicant: CANON KABUSHIKI KAISHA
Inventor： JUN MOIZUMI
IPC: G03F7/00
CPC classification number: G03F7/70641 , G03F7/706845
Abstract: An apparatus includes a control unit configured to control an adjustment unit for adjusting imaging characteristics of an optical system. In a period spanning a plurality of lots, the control unit measures imaging characteristics of the optical system, and decides a prediction coefficient in a prediction formula to fit the prediction formula to measurement data obtained by the measurement in the period spanning the plurality of lots. The prediction formula is a polynomial function including a term representing a change in measurement value of the imaging characteristics caused by changing at least one of an illumination mode and an original between lots. The control unit decides the term of the polynomial function such that a fitting residual falls within an allowable range.
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