公开(公告)号：US20170205717A1

公开(公告)日：2017-07-20

申请号：US15302146

申请日：2015-03-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Ronald VAN DER WILK ,  Ger-Wim Jan GOORHUIS

IPC: G03F7/20

CPC classification number: G03F7/70925 ,  H01L21/67028

Abstract: An apparatus for cleaning an object, the apparatus including: an object support for supporting the object; a low pressure chamber for exposing a first surface of the object to a low pressure when the object is arranged on the object support, an electrode arranged adjacent to and separated from the first surface of the object when the object is arranged on the object support, the electrode being in electrical communication with a surface of the object support which is adjacent the first surface of the object; and a power supply arranged to apply a voltage between the electrode and the object; thereby generating a discharge between the object and the electrode.