公开(公告)号：US12117726B2

公开(公告)日：2024-10-15

申请号：US18220799

申请日：2023-07-11

Applicant: ASML NETHERLANDS B.V.

Inventor： David Ferdinand Vles ,  Chaitanya Krishna Ande ,  Antonius Franciscus Johannes De Groot ,  Adrianus Johannes Maria Giesbers ,  Johannes Joseph Janssen ,  Paul Janssen ,  Johan Hendrik Klootwijk ,  Peter Simon Antonius Knapen ,  Evgenia Kurganova ,  Marcel Peter Meijer ,  Wouter Rogier Meijerink ,  Maxim Aleksandrovich Nasalevich ,  Arnoud Willem Notenboom ,  Raymond Olsman ,  Hrishikesh Patel ,  Mária Péter ,  Gerrit van den Bosch ,  Wilhelmus Theodorus Anthonius Johannes van den Einden ,  Willem Joan Van Der Zande ,  Pieter-Jan Van Zwol ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Willem-Pieter Voorthuijzen ,  Hendrikus Jan Wondergem ,  Aleksandar Nikolov Zdravkov

IPC: G03F1/64

CPC classification number: G03F1/64

Abstract: A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.