公开(公告)号：US09599908B2

公开(公告)日：2017-03-21

申请号：US14879852

申请日：2015-10-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Anthonius Martinus Cornelis Petrus De Jong ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Antonius Johannus Van Der Net ,  Peter Franciscus Wanten ,  Jacques Cor Johan Van Der Donck ,  Robert Douglas Watso ,  Teunis Cornelis Van Den Dool ,  Nadja Schuh ,  Jan Willem Cromwijk

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).