公开(公告)号：US09599908B2

公开(公告)日：2017-03-21

申请号：US14879852

申请日：2015-10-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Anthonius Martinus Cornelis Petrus De Jong ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Antonius Johannus Van Der Net ,  Peter Franciscus Wanten ,  Jacques Cor Johan Van Der Donck ,  Robert Douglas Watso ,  Teunis Cornelis Van Den Dool ,  Nadja Schuh ,  Jan Willem Cromwijk

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).

公开(公告)号：US09638643B2

公开(公告)日：2017-05-02

申请号：US14389075

申请日：2013-03-28

Applicant: ASML Netherlands B.V. ,  TNO

Inventor： Antonius Martinus Cornelis Petrus De Jong ,  Jacques Cor Johan Van Der Donck

IPC: G01N21/00 ,  G01N21/94 ,  G03F7/20 ,  G03F1/82 ,  B32B37/24 ,  B32B38/10 ,  G01N21/956 ,  G01N21/47 ,  G01N1/02 ,  G01N1/28

CPC classification number: G01N21/94 ,  B32B37/24 ,  B32B38/10 ,  B32B2037/243 ,  G01N21/47 ,  G01N21/956 ,  G01N2001/028 ,  G01N2001/2833 ,  G01N2201/06113 ,  G01N2201/105 ,  G03F1/82 ,  G03F7/7085 ,  G03F7/70908

Abstract: A particulate contamination measurement method and apparatus are discussed. The method, for example, comprises pressing a measurement surface (5) of a polyurethane elastomer (2) against a surface (7) to be measured, removing the polyurethane elastomer from the surface without leaving residues, then using an optical apparatus (11) to detect particles (8) which have been removed by the polyurethane elastomer from the surface and which have become attached to the polyurethane elastomer.