公开(公告)号：US20150055103A1

公开(公告)日：2015-02-26

申请号：US14473700

申请日：2014-08-29

申请人： ASML NETHERLANDS B.V.

发明人： David BESSEMS ,  Rogier Hendrikus Magdalena Cortie ,  Marcus Johannes Van der Zanden ,  Cornelius Maria Rops ,  Paul Willems ,  Jimmy Matheus Wilhelmus Van de Winkel ,  Erik Henricus Egidius Catharina Eummelen

IPC分类号： G03F7/20

CPC分类号： G03F7/70341

摘要： A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the meniscus pinning feature and at least partly surrounding the gas supply opening.

摘要翻译： 一种用于光刻设备的流体处理结构，所述流体处理结构在从被配置为将浸没流体包含在流体处理结构外部的区域的空间的边界处具有：弯液面锁定特征，以阻止浸没流体在径向向外 方向从空间; 位于弯月面钉扎特征的径向外侧的气体供应开口; 以及位于弯液面钉扎特征的径向外侧并且至少部分地围绕气体供应开口的气体回收开口。