公开(公告)号：US11231653B2

公开(公告)日：2022-01-25

申请号：US17186117

申请日：2021-02-26

申请人： ASML NETHERLANDS B.V.

发明人： Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Johannes Cornelis Paulus Melman ,  Han Henricus Aldegonda Lempens ,  Miao Yu ,  Cornelius Maria Rops ,  Ruud Olieslagers ,  Artunç Ulucan ,  Theodorus Wilhelmus Polet ,  Patrick Johannes Wilhelmus Spruytenburg

IPC分类号： G03F7/20 ,  H01L21/027

摘要： An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.

公开(公告)号：US10969695B2

公开(公告)日：2021-04-06

申请号：US16570382

申请日：2019-09-13

申请人： ASML NETHERLANDS B.V.

发明人： Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Johannes Cornelis Paulus Melman ,  Han Henricus Aldegonda Lempens ,  Miao Yu ,  Cornelius Maria Rops ,  Ruud Olieslagers ,  Artunç Ulucan ,  Theodorus Wilhelmus Polet ,  Patrick Johannes Wilhelmus Spruytenburg

IPC分类号： H01L21/027 ,  G03F7/20

摘要： An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.

公开(公告)号：US10409174B2

公开(公告)日：2019-09-10

申请号：US15317386

申请日：2015-05-12

申请人： ASML NETHERLANDS B.V.

发明人： Aart Adrianus Van Beuzekom ,  Jozef Augustinus Maria Alberti ,  Hubert Marie Segers ,  Ronald Van Der Ham ,  Francis Fahrni ,  Ruud Olieslagers ,  Gerben Pieterse ,  Cornelius Maria Rops ,  Pepijn Van Den Eijnden ,  Paul Van Dongen ,  Bas Willems

IPC分类号： H01L21/52 ,  H01L21/67 ,  G03F7/20

摘要： A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.

公开(公告)号：US10018921B2

公开(公告)日：2018-07-10

申请号：US15688262

申请日：2017-08-28

申请人： ASML NETHERLANDS B.V.

发明人： Cornelius Maria Rops ,  Nicolaas Rudolf Kemper ,  Michel Riepen

IPC分类号： G03B27/52 ,  G03B27/68 ,  G03B27/58 ,  G03F7/20

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus is disclosed that includes a fluid handling system configured to confine immersion liquid to a localized space between a final element of a projection system and a substrate and/or table and a gas supplying device configured to supply gas with a solubility in immersion liquid of greater than 5×10−3 mol/kg at 20° C. and 1 atm total pressure to an area adjacent the space.

公开(公告)号：US09213246B2

公开(公告)日：2015-12-15

申请号：US14179276

申请日：2014-02-12

申请人： ASML NETHERLANDS B.V.

发明人： Nicolaas Rudolf Kemper ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Michel Riepen ,  Martinus Wilhelmus Van Den Heuvel ,  Paul Petrus Joannes Berkvens ,  Christophe De Metsenaere ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Cornelius Maria Rops

IPC分类号： G03F7/20 ,  F01N1/02

CPC分类号： G03F7/70341 ,  F01N1/023 ,  G03F7/709

摘要： An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.

摘要翻译： 浸没式光刻设备通常包括流体处理系统。 流体处理系统通常具有配置成从给定位置去除气体和液体的混合物的两相流体萃取系统。 因为提取液包含两相，所以提取系统中的压力可以变化。 该压力变化可以通过浸没液体并导致曝光不准确。 为了减少提取系统中的压力波动，可以使用缓冲室。 该缓冲室可以连接到流体提取系统，以便提供减小压力波动的一定体积的气体。 或者或另外，柔性壁可以设置在流体提取系统的某处。 响应于流体提取系统中的压力变化，柔性壁可以改变形状。 通过改变形状，柔性壁可以帮助减少或消除压力波动。

公开(公告)号：US20150055103A1

公开(公告)日：2015-02-26

申请号：US14473700

申请日：2014-08-29

申请人： ASML NETHERLANDS B.V.

发明人： David BESSEMS ,  Rogier Hendrikus Magdalena Cortie ,  Marcus Johannes Van der Zanden ,  Cornelius Maria Rops ,  Paul Willems ,  Jimmy Matheus Wilhelmus Van de Winkel ,  Erik Henricus Egidius Catharina Eummelen

IPC分类号： G03F7/20

CPC分类号： G03F7/70341

摘要： A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the meniscus pinning feature and at least partly surrounding the gas supply opening.

摘要翻译： 一种用于光刻设备的流体处理结构，所述流体处理结构在从被配置为将浸没流体包含在流体处理结构外部的区域的空间的边界处具有：弯液面锁定特征，以阻止浸没流体在径向向外 方向从空间; 位于弯月面钉扎特征的径向外侧的气体供应开口; 以及位于弯液面钉扎特征的径向外侧并且至少部分地围绕气体供应开口的气体回收开口。

公开(公告)号：US11614689B2

公开(公告)日：2023-03-28

申请号：US17580696

申请日：2022-01-21

申请人： ASML NETHERLANDS B.V.

发明人： Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Johannes Cornelis Paulus Melman ,  Han Henricus Aldegonda Lempens ,  Miao Yu ,  Cornelius Maria Rops ,  Ruud Olieslagers ,  Artunç Ulucan ,  Theodorus Wilhelmus Polet ,  Patrick Johannes Wilhelmus Spruytenburg

IPC分类号： G03F7/20 ,  H01L21/027

摘要： An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.

公开(公告)号：US10001712B2

公开(公告)日：2018-06-19

申请号：US15328376

申请日：2015-06-26

申请人： ASML Netherlands B.V.

发明人： Theodorus Wilhelmus Polet ,  Johannes Jacobus Matheus Baselmans ,  Willem Jan Bouman ,  Han Henricus Aldegonda Lempens ,  Theodorus Marinus Modderman ,  Cornelius Maria Rops ,  Bart Smeets ,  Koen Steffens ,  Ronald Van Der Ham

IPC分类号： G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/7095

摘要： An immersion lithographic apparatus includes a projection system. The projection system is configured to project a patterned radiation beam through an immersion liquid onto a target portion of a substrate. An external surface of the projection system includes a first surface. The first surface has a non-planar shape. An element is attached to the first surface and positioned so that at least a portion of the element contacts the immersion liquid in use. The element includes a closed loop of continuously integral material in a preformed state and conforms to the non-planar shape of the first surface.

公开(公告)号：US09291914B2

公开(公告)日：2016-03-22

申请号：US14473700

申请日：2014-08-29

申请人： ASML NETHERLANDS B.V.

发明人： David Bessems ,  Rogier Hendrikus Magdalena Cortie ,  Marcus Johannes Van Der Zanden ,  Cornelius Maria Rops ,  Paul Willems ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Erik Henricus Egidius Catharina Eummelen

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70341

摘要： A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the meniscus pinning feature and at least partly surrounding the gas supply opening.

摘要翻译： 一种用于光刻设备的流体处理结构，所述流体处理结构在从被配置为将浸没流体包含在流体处理结构外部的区域的空间的边界处具有：弯液面锁定特征，以阻止浸没流体在径向向外 方向从空间; 位于弯月面钉扎特征的径向外侧的气体供应开口; 以及位于弯液面钉扎特征的径向外侧并且至少部分地围绕气体供应开口的气体回收开口。

公开(公告)号：US20140300879A1

公开(公告)日：2014-10-09

申请号：US14179276

申请日：2014-02-12

申请人： ASML NETHERLANDS B.V.

发明人： Nicolaas Rudolf KEMPER ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Michel Riepen ,  Martinus Wilhelmus Van Den Heuvel ,  Paul Petrus Joannes Berkvens ,  Christophe De Metsenaere ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Cornelius Maria Rops

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  F01N1/023 ,  G03F7/709

摘要： An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.

摘要翻译： 浸没式光刻设备通常包括流体处理系统。 流体处理系统通常具有配置成从给定位置去除气体和液体的混合物的两相流体萃取系统。 因为提取液包含两相，所以提取系统中的压力可以变化。 该压力变化可以通过浸没液体并导致曝光不准确。 为了减少提取系统中的压力波动，可以使用缓冲室。 该缓冲室可以连接到流体提取系统，以便提供减小压力波动的一定体积的气体。 或者或另外，柔性壁可以设置在流体提取系统的某处。 响应于流体提取系统中的压力变化，柔性壁可以改变形状。 通过改变形状，柔性壁可以帮助减少或消除压力波动。