公开(公告)号：US20250021018A1

公开(公告)日：2025-01-16

申请号：US18712176

申请日：2022-11-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Joost Cyrillus Lambert HAGEMAN ,  Marie-Claire VAN LARE ,  Hans VAN DER LAAN

IPC: G03F7/00 ,  G03F1/82

Abstract: A method for improving imaging of a feature on a mask to a substrate during scanning operation of a lithographic apparatus. The method includes obtaining a dynamic pupil representing evolution of an angular distribution of radiation exposing a mask during a scanning operation of a lithographic apparatus and determining a variation of shift of a feature at a substrate during the scanning operation due to interaction of the dynamic pupil with the mask. The method includes configuring a mask parameter and/or or a control parameter of the lithographic apparatus to reduce the variation of shift of the feature.