公开(公告)号：US11029594B2

公开(公告)日：2021-06-08

申请号：US16332075

申请日：2017-08-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Steven George Hansen ,  Kateryna Stanislavovna Lyakhova ,  Paulus Jacobus Maria Van Adrichem

IPC: G06F30/33 ,  G03F1/36 ,  G03F7/20 ,  G06F17/10 ,  G06F30/398

Abstract: A method including obtaining a selected component of optical aberration of or for a lithography apparatus, under a processing condition; computing an approximate of a cost function, based on the selected component; and producing an adjustment of the lithography apparatus or a patterning process that uses the lithography apparatus, based on the approximate of the cost function.