公开(公告)号：US11150563B2

公开(公告)日：2021-10-19

申请号：US16708509

申请日：2019-12-10

申请人： ASML NETHERLANDS B.V.

发明人： Sergei Sokolov ,  Sergey Tarabrin ,  Su-Ting Cheng ,  Armand Eugene Albert Koolen ,  Markus Franciscus Antonius Eurlings ,  Koenraad Remi André Maria Schreel

IPC分类号： G03F7/20

摘要： A technique of measuring a parameter of a patterning process is disclosed. In one arrangement, a target, formed by the patterning process, is illuminated. A sub-order diffraction component of radiation scattered from the target is detected and used to determine the parameter of the patterning process.

公开(公告)号：US10884345B2

公开(公告)日：2021-01-05

申请号：US16822870

申请日：2020-03-18

申请人： ASML Netherlands B.V.

发明人： Emil Peter Schmitt-Weaver ,  Jens Stäcker ,  Koenraad Remi André Maria Schreel ,  Roy Werkman

IPC分类号： G03F9/00 ,  G03F7/20

摘要： A first substrate 2002 has a calibration pattern applied to a first plurality of fields 2004 by a lithographic apparatus. Further substrates 2006, 2010 have calibration patterns applied to further pluralities of fields 2008, 2012. The different pluralities of fields have different sizes and/or shapes and/or positions. Calibration measurements are performed on the patterned substrates 2002, 2006, 2010 and used to obtain corrections for use in controlling the apparatus when applying product patterns to subsequent substrates. Measurement data representing the performance of the apparatus on fields of two or more different dimensions (fields 2004, 2008, 2012 in this example) is gathered together in a database 2013 and used to synthesize the information needed to calibrate the apparatus for a new size. Calibration data is also obtained for different scan and step directions.