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公开(公告)号：US09645500B2
公开(公告)日：2017-05-09
申请号：US14910995
申请日：2014-07-24
Applicant: ASML Netherlands B.V.
CPC classification number: G03F7/70133 , G02B27/44 , G02B27/50 , G03F7/70041 , H01S3/005 , H01S3/1307 , H01S3/2391 , H05G2/006 , H05G2/008
Abstract: A radiation source includes a nozzle configured to direct a stream of fuel droplets along a droplet path towards a plasma formation location, and is configured to receive a gaussian radiation beam having gaussian intensity distribution, having a predetermined wavelength and propagating along a predetermined trajectory, and further configured to focus the radiation beam on a fuel droplet at the plasma formation location. The radiation source includes a phase plate structure including one or more phase plates. The phase plate structure has a first zone and a second zone. The zones are arranged such that radiation having the predetermined wavelength passing through the first zone and radiation having the predetermined wavelength passing through the second zone propagate along respective optical paths having different optical path lengths. A difference between the optical path lengths is an odd number of times half the predetermined wavelength.
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公开(公告)号：US09778575B2
公开(公告)日：2017-10-03
申请号：US14988944
申请日：2016-01-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Van Greevenbroek , Paul Van Der Veen , Patricius Aloysius Jacobus Tinnemans , Wilfred Edward Endendijk
CPC classification number: G03F7/70058 , G03F7/70116 , G03F7/702 , G03F7/70216
Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.
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公开(公告)号：US10754259B2
公开(公告)日：2020-08-25
申请号：US16313816
申请日：2017-06-16
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Abstract: An illumination system for a metrology apparatus that can achieve illumination spatial profile flexibility, high polarization extinction ratio, and high contrast. The illumination system includes a polarizing beam splitter (PBS), an illumination mode selector (IMS), and a reflective spatial light modulator (SLM). The PBS divides an illumination beam into sub-beams. The IMS has a plurality of apertures that transmits at least one sub-beam and may be arranged in multiple illumination positions corresponding to illumination modes. A pixel array of the reflective SLM and reflects a portion of the sub-beam transmitted by the IMS back to the IMS and PBS. The PBS, IMS, SLM collectively generates a complex amplitude or intensity spatial profile of the transmitted sub-beam.
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Patent Agency Ranking
公开(公告)号：US10222703B2
公开(公告)日：2019-03-05
申请号：US15653380
申请日：2017-07-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Van Greevenbroek , Paul Van Der Veen , Patricius Aloysius Jacobus Tinnemans , Wilfred Edward Endendijk
Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.
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公开(公告)号：US10289006B2
公开(公告)日：2019-05-14
申请号：US14648452
申请日：2013-11-26
Applicant: ASML Netherlands B.V.
Inventor： Jan Bernard Plechelmus Van Schoot , Markus Franciscus Antonius Eurlings , Hermanus Johannes Maria Kreuwel
Abstract: A beam delivery apparatus is used with a laser produced plasma source. The beam delivery apparatus comprises variable zoom optics (550) operable to condition a beam of radiation so as to output a conditioned beam having a configurable beam diameter (b) and a plurality of mirrors (530a, 530b) operable to direct the conditioned beam of radiation to a plasma generation site. The beam delivery apparatus enables control of the axial position of the beam where the beam has a particular diameter, with respect to the beam's focus position (570). Also, a method is used to control the axial position of the location at a plasma generation site where a beam has a particular diameter, with respect to the beam's focus position.
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公开(公告)号：US09835950B2
公开(公告)日：2017-12-05
申请号：US15112602
申请日：2014-12-19
Applicant: ASML Netherlands B.V.
Inventor： Markus Franciscus Antonius Eurlings , Niek Antonius Jacobus Maria Kleemans , Antonius Johannes Josephus Van Dijsseldonk , Ramon Mark Hofstra , Oscar Franciscus Jozephus Noordman , Tien Nang Pham , Jan Bernard Plechelmus Van Schoot , Jiun-Cheng Wang , Kevin Weimin Zhang
CPC classification number: G03F7/70091 , G02B19/0019 , G02B27/0905 , G02B27/0983 , G03F7/70033 , G03F7/70175 , H05G2/005 , H05G2/008
Abstract: A faceted reflector (32, 32″) for receiving an incident radiation beam (2) and directing a reflected radiation beam at a target. The faceted reflector comprises a plurality of facets, each of the plurality of facets comprising a reflective surface. The reflective surfaces of each of a first subset of the plurality of facets define respective parts of a first continuous surface and are arranged to reflect respective first portions of the incident radiation beam in a first direction to provide a first portion of the reflected radiation beam. The reflective surfaces of each of a second subset of the plurality of facets define respective parts of a second continuous surface and are arranged to reflect respective second portions of the incident radiation beam in a second direction to provide a second portion of the reflected radiation beam.
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公开(公告)号：US11150563B2
公开(公告)日：2021-10-19
申请号：US16708509
申请日：2019-12-10
Applicant: ASML NETHERLANDS B.V.
Inventor： Sergei Sokolov , Sergey Tarabrin , Su-Ting Cheng , Armand Eugene Albert Koolen , Markus Franciscus Antonius Eurlings , Koenraad Remi André Maria Schreel
IPC: G03F7/20
Abstract: A technique of measuring a parameter of a patterning process is disclosed. In one arrangement, a target, formed by the patterning process, is illuminated. A sub-order diffraction component of radiation scattered from the target is detected and used to determine the parameter of the patterning process.
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公开(公告)号：US10222702B2
公开(公告)日：2019-03-05
申请号：US15550855
申请日：2016-01-21
Applicant: ASML Netherlands B.V.
Inventor： Arno Jan Bleeker , Ramon Mark Hofstra , Erik Petrus Buurman , Johannes Hubertus Josephina Moors , Alexander Matthijs Struycken , Harm-Jan Voorma , Sumant Sukdew Ramanujan Oemrawsingh , Markus Franciscus Antonius Eurlings , Peter Frans Maria Muys
Abstract: A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.
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