公开(公告)号：US11940264B2

公开(公告)日：2024-03-26

申请号：US17624276

申请日：2020-06-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Johannes Mathias Theodorus Antonius Adriaens ,  Carolus Johannes Catharina Schoormans ,  Luuk Johannes Helena Seelen

IPC: G01B11/00 ,  G03F7/00

CPC classification number: G01B11/005 ,  G03F7/70775 ,  G03F7/7085

Abstract: A method for calibrating a mirror of an interferometer system configured to measure a position of an object using two interferometers of the interferometer system that are arranged at opposite sides of the object and configured to measure the position of the object in the same X-direction, wherein two sets of measurements are obtained for different rotational orientations about an axis perpendicular to the X-direction to determine a shape of the mirror. There is also provided a position measuring method in which the obtained shape of the mirror is used to adjust measurements in the X-direction, a lithographic apparatus and a device manufacturing method making use of such a lithographic apparatus.