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1.发明申请公开(公告)号：US20150241795A1
公开(公告)日：2015-08-27
申请号：US14430507
申请日：2013-09-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Jeroen Dekkers , Andre Bernardus Jeunink , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Michael Jozef Mathijs Renkens , Carolus Johannes Catharina Schoormans , Peter Hoekstra
CPC classification number: G03F7/70775 , G01D5/2449 , G01D5/34707 , G01D18/00 , G01D18/008 , G03F7/70516
Abstract: A method for calibrating an encoder scale having an array of marks in a first direction, includes moving the encoder scale in the first direction relative to a first encoder-type sensor, a second encoder-type sensor and a third encoder-type sensor, wherein the first encoder-type sensor and the second encoder-type sensor are fixedly spaced in the first direction at a first distance relative to each other, wherein the second encoder-type sensor and the third encoder-type sensor are fixedly spaced in the first direction at a second distance relative to each other.
Abstract translation: 一种用于校准具有第一方向的标记阵列的编码器刻度的方法，包括相对于第一编码器型传感器，第二编码器型传感器和第三编码器型传感器沿第一方向移动编码器刻度，其中 第一编码器型传感器和第二编码器型传感器在第一方向上相对于彼此以第一距离固定间隔，其中第二编码器型传感器和第三编码器型传感器在第一方向上固定间隔开 在相对于彼此的第二距离处。
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公开(公告)号：US11619886B2
公开(公告)日：2023-04-04
申请号：US16975745
申请日：2019-03-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Johannes Mathias Theodorus Antonius Adriaens , Carolus Johannes Catharina Schoormans , Thomas Voβ
IPC: G03F7/20 , G01B9/02015
Abstract: A position measurement system including a first interferometer and a second interferometer arranged to determine a distance of the object in a first direction when the object is in a first measurement area by emitting beams onto a target surface of the object. The position measurement system further has a third interferometer and a fourth interferometer arranged to determine a distance of the object in the first direction when the object is in a second measurement area by emitting beams onto the target surface of the object. An arrangement of relative positions in a second direction of beams spots impinging on the target surface from the beams emitted by the first and second interferometers is different from an arrangement of relative positions in the second direction of beams spots impinging on the target surface from the beams emitted by the third and fourth interferometers.
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公开(公告)号：US10444635B2
公开(公告)日：2019-10-15
申请号：US16098350
申请日：2017-04-05
Applicant: ASML Netherlands B.V.
Inventor： Carolus Johannes Catharina Schoormans , Johannes Jacobus Matheus Baselmans , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Aldegonda Theodorus Marie Van Den Homberg , Maksym Yuriiovych Sladkov , Andreas Johannes Antonius Brouns , Alexander Viktorovych Padiy
Abstract: A lithographic method for measuring a position of a target grating with a mask sensor apparatus which comprises a plurality of detector modules each comprising a diffraction grating located at a mask side of a projection system of a lithographic apparatus and an associated detector, the method comprising a first step of measuring first intensities of a combination of diffraction orders diffracted from the target grating while the mask sensor apparatus is moved relatively to the target grating along a first direction; a second step of displacing the mask sensor apparatus relative to the target grating in a second direction, wherein a size of the relative displacement is proportional to a spatial frequency of a potential error; and a third step of measuring second intensities of the combination of diffraction orders diffracted from the target grating while the mask sensor apparatus is moved relatively to the target grating along the first direction.
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公开(公告)号：US11940264B2
公开(公告)日：2024-03-26
申请号：US17624276
申请日：2020-06-05
Applicant: ASML NETHERLANDS B.V.
Inventor： Johannes Mathias Theodorus Antonius Adriaens , Carolus Johannes Catharina Schoormans , Luuk Johannes Helena Seelen
CPC classification number: G01B11/005 , G03F7/70775 , G03F7/7085
Abstract: A method for calibrating a mirror of an interferometer system configured to measure a position of an object using two interferometers of the interferometer system that are arranged at opposite sides of the object and configured to measure the position of the object in the same X-direction, wherein two sets of measurements are obtained for different rotational orientations about an axis perpendicular to the X-direction to determine a shape of the mirror. There is also provided a position measuring method in which the obtained shape of the mirror is used to adjust measurements in the X-direction, a lithographic apparatus and a device manufacturing method making use of such a lithographic apparatus.
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公开(公告)号：US10747120B2
公开(公告)日：2020-08-18
申请号：US16558265
申请日：2019-09-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Carolus Johannes Catharina Schoormans , Petrus Franciscus Van Gils , Johannes Jacobus Matheus Baselmans
Abstract: A measurement method comprising using multiple radiation poles to illuminate a diffraction grating on a mask at a mask side of a projection system of a lithographic apparatus, coupling at least two different resulting diffraction orders per illumination pole through the projection system, using the projection system to project the diffraction orders onto a grating on a wafer such that a pair of combination diffraction orders is formed by diffraction of the diffraction orders, coupling the combination diffraction orders back through the projection system to detectors configured to measure the intensity of the combination diffraction orders, and using the measured intensity of the combination diffraction orders to measure the position of the wafer grating.
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Patent Agency Ranking
公开(公告)号：US20160195823A1
公开(公告)日：2016-07-07
申请号：US15046284
申请日：2016-02-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Yvonne Wendela KRUIJT-STEGEMAN , Andre Bernardus Jeunink , Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Johan Frederik Dijksman , Carolus Johannes Catharina Schoormans , Adrianus Hendrik Koevoets , Catharinus De Schiffart , Sander Frederik Wuister
Abstract: An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.
Abstract translation: 公开了一种压印光刻设备，其包括布置成保持压印模板的压印模板保持器和被配置为测量压印模板的尺寸和/或形状的变化的多个位置传感器，其中位置传感器与 印记模板 还公开了一种光刻方法，其包括使用压印模板将图案印刷到基板上，以及在将图案压印到基板上的同时测量压印模板的尺寸和/或形状的变化。
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公开(公告)号：US10712678B2
公开(公告)日：2020-07-14
申请号：US15046284
申请日：2016-02-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Yvonne Wendela Kruijt-Stegeman , Andre Bernardus Jeunink , Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Johan Frederik Dijksman , Carolus Johannes Catharina Schoormans , Adrianus Hendrik Koevoets , Catharinus De Schiffart , Sander Frederik Wuister
IPC: B29C43/58 , G03F9/00 , B82Y10/00 , B82Y40/00 , G03F7/00 , G03F7/20 , B29C43/02 , B29C59/02 , B29C59/16
Abstract: An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.
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公开(公告)号：US10401735B2
公开(公告)日：2019-09-03
申请号：US15778093
申请日：2016-11-03
Applicant: ASML NETHERLANDS B.V.
Inventor： Carolus Johannes Catharina Schoormans , Petrus Franciscus Van Gils , Johannes Jacobus Matheus Baselmans
Abstract: A measurement method comprising using multiple radiation poles to illuminate a diffraction grating on a mask at a mask side of a projection system of a lithographic apparatus, coupling at least two different resulting diffraction orders per illumination pole through the projection system, using the projection system to project the diffraction orders onto a grating on a wafer such that a pair of combination diffraction orders is formed by diffraction of the diffraction orders, coupling the combination diffraction orders back through the projection system to detectors configured to measure the intensity of the combination diffraction orders, and using the measured intensity of the combination diffraction orders to measure the position of the wafer grating.
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公开(公告)号：US10088756B2
公开(公告)日：2018-10-02
申请号：US15321184
申请日：2015-06-04
Applicant: ASML Netherlands B.V.
Inventor： Sander Kerssemakers , Wilhelmus Petrus De Boeij , Gerben Frank De Lange , Christiaan Alexander Hoogendam , Petrus Franciscus Van Gils , Jelmer Mattheüs Kamminga , Jan Jaap Kuit , Carolus Johannes Catharina Schoormans
IPC: G03F7/20
Abstract: A lithographic apparatus comprising a support structure configured to be moved by a first scan distance during a single scanning operation when supporting a patterning device having a first extent in the scanning direction and to be moved by a second scan distance during a single scanning operation when supporting a patterning device having a second extent in the scanning N direction, and a substrate table configured to be moved by a third scan distance during a single scanning operation when the support structure supports a patterning device having the first extent in the scanning direction and to be moved by a fourth scan distance during a single scanning operation when the support structure supports a patterning device having the second extent in the scanning direction.
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公开(公告)号：US09606458B2
公开(公告)日：2017-03-28
申请号：US14430507
申请日：2013-09-12
Applicant: ASML Netherlands B.V.
Inventor： Jeroen Dekkers , Andre Bernardus Jeunink , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Michael Jozef Mathijs Renkens , Carolus Johannes Catharina Schoormans , Peter Hoekstra
CPC classification number: G03F7/70775 , G01D5/2449 , G01D5/34707 , G01D18/00 , G01D18/008 , G03F7/70516
Abstract: A method for calibrating an encoder scale having an array of marks in a first direction, includes moving the encoder scale in the first direction relative to a first encoder-type sensor, a second encoder-type sensor and a third encoder-type sensor, wherein the first encoder-type sensor and the second encoder-type sensor are fixedly spaced in the first direction at a first distance relative to each other, wherein the second encoder-type sensor and the third encoder-type sensor are fixedly spaced in the first direction at a second distance relative to each other.
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