公开(公告)号：US20180299796A1

公开(公告)日：2018-10-18

申请号：US15570934

申请日：2016-03-29

Applicant: ASML Netherlands B.V.

Inventor： Günes NAKIBOGLU ,  Maarten HOLTRUST ,  Martinus VAN DUIJNHOVEN ,  Francis FAHRNI ,  Frank Johannes Jacobus VAN BOXTEL ,  Anne Willemijn Bertine QUIST ,  Bart Dinand PAARHUIS ,  Daan Daniel Johannes VAN SOMMEREN

IPC: G03F7/20

Abstract: A lithographic apparatus has: a conduit through which a gas can flow; a gas mover configured to cause the gas to flow in the conduit; a wall in contact with the gas in the conduit and defining a membrane aperture therein; and an acoustic filter including a flexible membrane fixed in the membrane aperture. The acoustic filter reduces transmission of acoustic disturbances without adding any flow resistance.

公开(公告)号：US20210116824A1

公开(公告)日：2021-04-22

申请号：US16981813

申请日：2019-03-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Miao YU ,  Petrus, Martinus, Gerardus, Jothannes ARTS ,  Erik, Henricus, Egidius, Catharina EUMMELEN ,  Giovanni Luca GATTOBIGIO ,  Maarten HOLTRUST ,  Han, Henricus, Aldegonda LEMPENS ,  Ferdy MIGCHELBRINK ,  Theodorus Wilhelmus POLET ,  Gheorghe TANASA

IPC: G03F7/20

Abstract: A cleaning device for an apparatus for processing production substrates, the cleaning device including: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber.