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公开(公告)号：US20220100107A1
公开(公告)日：2022-03-31
申请号：US17435115
申请日：2020-02-14
Applicant: ASML NETHERLANDS B.V.
Inventor： Henricus Martinus Johannes VAN DE GROES , Johannes Hubertus Antonius VAN DE RIJDT , Marcel Pieter Jacobus PEETERS , Chien-Hung TSENG , Henricus Petrus Maria PELLEMANS
IPC: G03F9/00
Abstract: A method of aligning a substrate within an apparatus. The method includes determining a substrate grid based on measurements of a plurality of targets, each at different locations on a substrate. The determining includes repetitions of updating the substrate grid after each measurement of a target, and using the updated grid to align a measurement of a subsequent target.
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