公开(公告)号：US20200373118A1

公开(公告)日：2020-11-26

申请号：US16992058

申请日：2020-08-12

Applicant: ASML Netherlands B.V.

Inventor： Marcel Koenraad Marie BAGGEN ,  Peter Paul HEMPENIUS ,  Maarten Frans Janus KREMERS ,  Robertus Jacobus Theodorus VAN KEMPEN ,  Sven Antoin Johan HOL ,  Henricus Martinus Johannes VAN DE GROES ,  Johannes Hubertus Antonius VAN DE RIJDT ,  Niels Johannes Maria BOSCH ,  Maarten Hartger KIMMAN

IPC: H01J37/20 ,  H01L21/66 ,  H01J37/28

Abstract: An electron beam apparatus is provided. The apparatus comprises an e-beam source configured to generate an electron beam, a first part configured to support a substrate, the first part comprising an object table for supporting the substrate, the first part further comprising a short stroke actuator system for actuating the object table relative to the e-beam source, the short stroke actuator system comprising a short stroke forcer. The apparatus further comprises a second part configured to movably support the first part and a long stroke actuator system configured to actuate movement of the first part with respect to the second part, the long stroke actuator system comprising a long stroke forcer, wherein the short stroke forcer and/or the long stroke forcer is configured to be switched off while the electron beam is projected onto the substrate.

公开(公告)号：US20220100107A1

公开(公告)日：2022-03-31

申请号：US17435115

申请日：2020-02-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Henricus Martinus Johannes VAN DE GROES ,  Johannes Hubertus Antonius VAN DE RIJDT ,  Marcel Pieter Jacobus PEETERS ,  Chien-Hung TSENG ,  Henricus Petrus Maria PELLEMANS

IPC: G03F9/00

Abstract: A method of aligning a substrate within an apparatus. The method includes determining a substrate grid based on measurements of a plurality of targets, each at different locations on a substrate. The determining includes repetitions of updating the substrate grid after each measurement of a target, and using the updated grid to align a measurement of a subsequent target.

公开(公告)号：US20230205101A1

公开(公告)日：2023-06-29

申请号：US17927348

申请日：2021-05-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Luuc KEULEN ,  Jeroen Gerard GOSEN ,  Dennis Herman Caspar VAN BANNING ,  Sampann ARORA ,  Michaél Johannes Christiaan RONDE ,  Lucas KUINDERSMA ,  Youssef Karel Maria DE VOS ,  Henricus Martinus Johannes VAN DE GROES ,  Allard Eelco KOOIKER ,  Wouter Onno PRIL ,  Johan VAN GEND

IPC: G03F7/20

CPC classification number: G03F7/70933 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70883 ,  G03F7/70725

Abstract: An apparatus for use in a metrology process or a lithographic process, the apparatus including: an object support module adapted to hold an object; and a first gas shower arranged on a first side of the object support module and adapted to emit a gas with a first velocity in a first gas direction which is a horizontal direction to cause a net gas flow in the apparatus to be a substantially horizontal gas flow in the first gas direction at least above the object support module.

公开(公告)号：US20180267410A1

公开(公告)日：2018-09-20

申请号：US15921124

申请日：2018-03-14

Applicant: ASML Netherlands B.V.

Inventor： Peter Paul HEMPENIUS ,  Marcel Koenraad Marie BAGGEN ,  Thomas Jan DE HOOG ,  Sinar JULIANA ,  Henricus Martinus Johannes VAN DE GROES

IPC: G03F7/20

Abstract: Disclosed is a stage system and metrology apparatus comprising at least one such stage system. The stage system comprises a stage carrier for holding an object and a stage carrier positioning actuator for displacing the stage carrier. The stage system also comprises a balance mass to counteract a displacement of the stage carrier, and a balance mass positioning actuator for displacing the balance mass. A cable arrangement is connected to the stage carrier for the supply of at least power to said stage carrier. The stage system is operable to apply a compensatory feed-forward force to the balance mass which compensates for a cable arrangement force exerted by the cable arrangement.

公开(公告)号：US20170255105A1

公开(公告)日：2017-09-07

申请号：US15443681

申请日：2017-02-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Johannes Matheus Marie DE WIT ,  Kim Gerard Feijen ,  Anko Jozef Cornelus Sijben ,  Martinus Maassen ,  Henricus Martinus Johannes VAN DE GROES

IPC: G03F7/20 ,  G01N21/88

CPC classification number: G03F7/70191 ,  G01N21/8806 ,  G01N2021/8835 ,  G02B21/082 ,  G02B21/361 ,  G02B21/365 ,  G03F7/70575 ,  G03F7/70616

Abstract: Disclosed is an illumination system for a metrology apparatus and a metrology apparatus comprising such an illumination system. The illumination system comprises an illumination source; and a linear variable filter arrangement configured to filter a radiation beam from said illumination source and comprising one or more linear variable filters. The illumination system is operable to enable selective control of a wavelength characteristic of the radiation beam subsequent to it being filtered by the linear variable filter arrangement.