公开(公告)号：US10386734B2

公开(公告)日：2019-08-20

申请号：US15760629

申请日：2016-08-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Nick Kant ,  Mark Jan Hendrik Luttikhof

IPC: G03B27/52 ,  G03F7/20

Abstract: A method of reducing effects of reticle heating and/or cooling in a lithographic process, the method including calibrating a linear time invariant reticle heating model using a system identification method; predicting distortions of the reticle using the reticle heating model and inputs in the lithographic process; and calculating and applying a correction in the lithographic process on the basis of the predicted distortions of the reticle.

公开(公告)号：US10429749B2

公开(公告)日：2019-10-01

申请号：US15760629

申请日：2016-08-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Nick Kant ,  Mark Jan Hendrik Luttikhof

IPC: G03B27/52 ,  G03F7/20

Abstract: A method of reducing effects of reticle heating and/or cooling in a lithographic process, the method including calibrating a linear time invariant reticle heating model using a system identification method; predicting distortions of the reticle using the reticle heating model and inputs in the lithographic process; and calculating and applying a correction in the lithographic process on the basis of the predicted distortions of the reticle.

公开(公告)号：US10564555B2

公开(公告)日：2020-02-18

申请号：US16458601

申请日：2019-07-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Nick Kant ,  Mark Jan Hendrik Luttikhof

IPC: G03B27/52 ,  G03F7/20

Abstract: A method of reducing effects of reticle heating and/or cooling in a lithographic process, the method including calibrating a linear time invariant reticle heating model using a system identification method; predicting distortions of the reticle using the reticle heating model and inputs in the lithographic process; and calculating and applying a correction in the lithographic process on the basis of the predicted distortions of the reticle.