SUBSTRATE TABLE AND METHOD OF HANDLING A SUBSTRATE

    公开(公告)号:US20230048723A1

    公开(公告)日:2023-02-16

    申请号:US17796545

    申请日:2021-01-20

    Abstract: Substrate tables for lithography and methods of handling a substrate. In one arrangement, a substrate table includes one or more membranes. An actuation system deforms each membrane to change a height of a portion of the membrane. In another arrangement, a substrate table includes one or more membranes and a clamping system for clamping a substrate to the substrate table, wherein the clamping deforms each membrane by pressing the substrate against the membrane.

    METHOD, SUBSTRATE AND SYSTEM FOR ESTIMATING STRESS IN A SUBSTRATE

    公开(公告)号:US20220113640A1

    公开(公告)日:2022-04-14

    申请号:US17423818

    申请日:2019-11-05

    Abstract: The present invention provides a testing substrate (W) for estimating stress in production substrates due to a substrate support, said testing substrate having a support surface (SS) divided into predefined portions, wherein the predefined portions comprise at least one first portion (1) having a first coefficient of friction being substantially uniform across the at least one first portion, and at least one second portion (2) having a second coefficient of friction being substantially uniform across the at least one second portion, wherein the second coefficient of friction is different to the first coefficient of friction. The present invention also provides a method for estimating stress in a substrate due to a substrate support and a system for making such an estimation.

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