公开(公告)号：US20190004435A1

公开(公告)日：2019-01-03

申请号：US16064332

申请日：2016-12-14

申请人： ASML NETHERLANDS B.V.

发明人： Pieter Willem Herman DE JAGER ,  Robert Albertus Johannes VAN DER WERF ,  Michaël Josephus Evert VAN DE MOOSDIJK ,  Pascale Anne MAURY

IPC分类号： G03F7/20 ,  B22F3/105 ,  G21B3/00

CPC分类号： G03F7/70391 ,  B22F3/1055 ,  B22F2003/1056 ,  B22F2998/10 ,  B22F2999/00 ,  B82Y40/00 ,  G03F7/70383 ,  G21B3/006 ,  Y02P10/295 ,  B22F9/14 ,  B22F1/0018 ,  B22F2201/10 ,  B22F2202/05 ,  B22F2202/06 ,  B22F2203/00

摘要： A patterning apparatus, including: a substrate holder constructed to support a substrate; a particle generator configured to generate particles in the patterning apparatus, the particle generator configured to deposit the particles onto the substrate to form a layer of particles on the substrate; and a pattern generator in the patterning apparatus, the pattern generator configured to applying a pattern in the patterning apparatus to the deposited layer of particles.