-
公开(公告)号：US20190004435A1
公开(公告)日：2019-01-03
申请号：US16064332
申请日：2016-12-14
发明人： Pieter Willem Herman DE JAGER , Robert Albertus Johannes VAN DER WERF , Michaël Josephus Evert VAN DE MOOSDIJK , Pascale Anne MAURY
CPC分类号： G03F7/70391 , B22F3/1055 , B22F2003/1056 , B22F2998/10 , B22F2999/00 , B82Y40/00 , G03F7/70383 , G21B3/006 , Y02P10/295 , B22F9/14 , B22F1/0018 , B22F2201/10 , B22F2202/05 , B22F2202/06 , B22F2203/00
摘要： A patterning apparatus, including: a substrate holder constructed to support a substrate; a particle generator configured to generate particles in the patterning apparatus, the particle generator configured to deposit the particles onto the substrate to form a layer of particles on the substrate; and a pattern generator in the patterning apparatus, the pattern generator configured to applying a pattern in the patterning apparatus to the deposited layer of particles.
-
公开(公告)号：US20180275528A1
公开(公告)日：2018-09-27
申请号：US15994068
申请日：2018-05-31
申请人： Carl Zeiss AG
发明人： Philipp Huebner , Gerhard Krampert , Stefan Richter , Timo Mappes
CPC分类号： G03F7/70383 , G03F7/70683 , G03F9/7007 , G03F9/7011
摘要： An optical system for producing lithographic structures is disclosed. Also disclosed is a method for determining relative coordinates of a position of a writing field relative to a position of a preview field in such an optical system, and a method for producing lithographic structures using such an optical system.
-
公开(公告)号：US20180196355A1
公开(公告)日：2018-07-12
申请号：US15608928
申请日：2017-05-30
发明人： Ka-Yi Yeh , Chun-Lung Lin , Shau-Yin Tseng
CPC分类号： G03F7/70383 , G02B26/124 , G02B26/127 , G03F7/70275 , G03F7/70291 , G03F7/70508
摘要： An exposing method adapted to a maskless photolithography process. The exposing method includes reading an exposure file; obtaining a plurality of coordinate information corresponding to a plurality of patterns contained in the exposure file, according to the exposure file; generating graphical data, according to the plurality of coordinate information; generating scanning data corresponding to each of a plurality of polygon mirrors or each of at least one polygon mirror group, according to the graphical data and a configuration of the polygon mirrors, wherein every two rotation directions of every two adjacent polygon mirrors of the plurality of polygon mirrors are different, or every two rotation directions of every two adjacent polygon mirrors of the at least one polygon mirror group are different.
-
公开(公告)号：US09975291B2
公开(公告)日：2018-05-22
申请号：US14441866
申请日：2013-12-19
发明人： Sohmei Endoh
IPC分类号： B29C59/02 , B29C33/38 , B29C43/02 , G03F7/20 , G03F7/32 , B29C59/04 , G02B1/118 , G03F7/00 , B82Y30/00 , B82Y40/00
CPC分类号： B29C59/022 , B29C33/38 , B29C33/3842 , B29C43/021 , B29C59/04 , B29C2059/023 , B29K2833/04 , B82Y30/00 , B82Y40/00 , G02B1/118 , G03F7/0002 , G03F7/20 , G03F7/2053 , G03F7/32 , G03F7/70383
摘要： A nanostructure that is visually recognized as being seamless by its more regularly and more uniformly formed fine concave-convex structure and that exhibits an excellent antireflection effect against light in a visible wavelength range is provided. Such a nanostructure is configured by a number of rows of tracks each including structures, formed by protrusions or depressions on a surface of a substrate, arranged at a predetermined fine pitch. In this nanostructure, a distance between centers of the structures adjacent to each other across a strip-shaped portion (seam) in which portions with no structures within the predetermined pitch are continuously formed in a track arrangement direction is adjusted so as to prevent visual recognition of the seam.
-
公开(公告)号：US20180059550A1
公开(公告)日：2018-03-01
申请号：US15693942
申请日：2017-09-01
发明人： Chad A. Mirkin , Xing Liao , Keith A. Brown , Guoliang Liu , Abrin L. Schmucke , Shu He , Wooyoung Shim , Daniel J. Eichelsdoerfer , Boris Rasin
CPC分类号： G03F7/7035 , B05D1/26 , B05D3/06 , B82Y40/00 , G02B13/143 , G03F7/0002 , G03F7/20 , G03F7/2049 , G03F7/70141 , G03F7/70325 , G03F7/70383 , G03F7/7045
摘要： In accordance with an embodiment of the disclosure, a tip array can include an elastomeric tip substrate layer comprising a first surface and an oppositely disposed second surface, the tip substrate layer being formed from an elastomeric material; a plurality of tips fixed to the first surface, the tips each comprising a tip end disposed opposite the first surface, the tips having a radius of curvature of less than about 1 micron; and an array of heaters disposed on the second surface of the tip substrate layer and configured such that when the tip substrate layer is heated by a heater, a tip disposed in a location of a heated portion of tip substrate layer is lowered relative to a tip disposed in a location of an unheated portion of the tip substrate layer.
-
公开(公告)号：US09891537B2
公开(公告)日：2018-02-13
申请号：US15348173
申请日：2016-11-10
发明人： Ji Young Chu , Shiva Ram Krishna , Tae Hyun Kim , Song Woo Bae , Sang Don Jang , Won Don Joo
IPC分类号： G03F7/20
CPC分类号： G03F7/70391 , G03F7/7005 , G03F7/70133 , G03F7/70208 , G03F7/70275 , G03F7/70291 , G03F7/70383 , G03F7/704 , G03F7/70425 , G03F7/70558 , G03F7/7085
摘要： Maskless lithographic apparatus measuring accumulated amount of light is provided. The maskless lithographic apparatus includes a light source which emits light, a stage on which a substrate is disposed, an optical system which converts the light into a beam spot array including a plurality of columns and a plurality of rows and irradiates the beam spot array onto the stage, a slit to which the beam spot array is irradiated and which passes an nth (n is a natural number) row of the beam spot array, an optical sensor which senses the nth row of the beam spot array which has passed through the slit, and a measuring unit which measures an accumulated amount of light in the nth row of the beam spot array sensed by the optical sensor.
-
公开(公告)号：US20170261862A1
公开(公告)日：2017-09-14
申请号：US15348173
申请日：2016-11-10
发明人： Ji Young CHU , Shiva Ram Krishna , Tae Hyun Kim , Song Woo Bae , Sang Don Jang , Won Don Joo
IPC分类号： G03F7/20
CPC分类号： G03F7/70391 , G03F7/7005 , G03F7/70133 , G03F7/70208 , G03F7/70275 , G03F7/70291 , G03F7/70383 , G03F7/704 , G03F7/70425 , G03F7/70558 , G03F7/7085
摘要： Maskless lithographic apparatus measuring accumulated amount of light is provided. The maskless lithographic apparatus includes a light source which emits light, a stage on which a substrate is disposed, an optical system which converts the light into a beam spot array including a plurality of columns and a plurality of rows and irradiates the beam spot array onto the stage, a slit to which the beam spot array is irradiated and which passes an nth (n is a natural number) row of the beam spot array, an optical sensor which senses the nth row of the beam spot array which has passed through the slit, and a measuring unit which measures an accumulated amount of light in the nth row of the beam spot array sensed by the optical sensor
-
公开(公告)号：US20170228493A1
公开(公告)日：2017-08-10
申请号：US15498804
申请日：2017-04-27
申请人： ARM Limited
发明人： Gregory Munson YERIC
CPC分类号： G06F17/5081 , G03F7/70383 , G03F7/70433 , G06F2217/12 , H01L21/027 , H01L22/14 , H01L22/20
摘要： Integrated circuits are manufactured using a direct write lithography step to at least partially form at least one layer within the integrated circuit. The performance characteristics of an at least partially formed integrated circuit are measured and then the layout design to be applied with a direct write lithography step is varied in dependence upon those performance characteristics. Accordingly, the performance of an individual integrated circuit, wafer of integrated circuits or batch of wafers may be altered.
-
公开(公告)号：US09690200B2
公开(公告)日：2017-06-27
申请号：US14867292
申请日：2015-09-28
发明人： Sangjoon Hong , Jongjin Lee , Hikuk Lee , Sangdon Jang , Inbae Chang
CPC分类号： G03F7/16 , G03F7/70383 , G03F7/70791 , G03F7/7085
摘要： An optical apparatus and a manufacturing method using the optical apparatus are disclosed. The optical apparatus includes a stage supporting a substrate, first optical systems providing a first light onto the substrate, a gantry supporting the first optical systems to transfer them on the stage, and second optical systems disposed between the gantry and the stage and detecting displacement of the first optical systems. Each of the second optical systems includes a beam source generating a second light different with the first light, and sensor arrays for sensing the second light provided to the first optical systems to detect displacement of the first optical systems.
-
公开(公告)号：US09672316B2
公开(公告)日：2017-06-06
申请号：US13944129
申请日：2013-07-17
申请人： ARM LIMITED
发明人： Gregory Munson Yeric
IPC分类号： G06F17/50 , H01L21/027 , G03F7/20 , H01L21/66
CPC分类号： G06F17/5081 , G03F7/70383 , G03F7/70433 , G06F2217/12 , H01L21/027 , H01L22/14 , H01L22/20
摘要： Integrated circuits are manufactured using a direct write lithography step to at least partially form at least one layer within the integrated circuit. The performance characteristics of an at least partially formed integrated circuit are measured and then the layout design to be applied with a direct write lithography step is varied in dependence upon those performance characteristics. Accordingly, the performance of an individual integrated circuit, wafer of integrated circuits or batch of wafers may be altered.
-
-
-
-
-
-
-
-
-
搜索结果
517 条记录 (耗时 0.024 秒)