公开(公告)号：US10527946B2

公开(公告)日：2020-01-07

申请号：US16064332

申请日：2016-12-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Pieter Willem Herman De Jager ,  Robert Albertus Johannes Van Der Werf ,  Michaël Josephus Evert Van De Moosdijk ,  Pascale Anne Maury

IPC: G03F7/20 ,  G21B3/00 ,  B22F3/105 ,  B82Y40/00

Abstract: A patterning apparatus, including: a substrate holder constructed to support a substrate; a particle generator configured to generate particles in the patterning apparatus, the particle generator configured to deposit the particles onto the substrate to form a layer of particles on the substrate; and a pattern generator in the patterning apparatus, the pattern generator configured to applying a pattern in the patterning apparatus to the deposited layer of particles.