公开(公告)号：US10928736B2

公开(公告)日：2021-02-23

申请号：US16064274

申请日：2016-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Pieter Willem Herman De Jager ,  Coen Adrianus Verschuren ,  Erwin Paul Smakman ,  Erwin John Van Zwet ,  Wouter Frans Willem Mulckhuyse ,  Pieter Verhoeff ,  Robert Albertus Johannes Van Der Werf

IPC: G03F7/20 ,  G03B27/42

Abstract: An exposure apparatus including: a substrate holder constructed to support a substrate; a patterning device configured to provide radiation modulated according to a desired pattern, the patterning device including a plurality of two-dimensional arrays of radiation sources, each radiation source configured to emit a radiation beam; a projection system configured to project the modulated radiation onto the substrate, the projection system including a plurality of optical elements arranged side by side and arranged such that a two-dimensional array of radiation beams from a two-dimensional array of radiation sources impinges a single optical element of the plurality of optical elements; and an actuator configured to provide relative motion between the substrate and the plurality of two-dimensional arrays of radiation sources in a scanning direction to expose the substrate.

公开(公告)号：US10527946B2

公开(公告)日：2020-01-07

申请号：US16064332

申请日：2016-12-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Pieter Willem Herman De Jager ,  Robert Albertus Johannes Van Der Werf ,  Michaël Josephus Evert Van De Moosdijk ,  Pascale Anne Maury

IPC: G03F7/20 ,  G21B3/00 ,  B22F3/105 ,  B82Y40/00

Abstract: A patterning apparatus, including: a substrate holder constructed to support a substrate; a particle generator configured to generate particles in the patterning apparatus, the particle generator configured to deposit the particles onto the substrate to form a layer of particles on the substrate; and a pattern generator in the patterning apparatus, the pattern generator configured to applying a pattern in the patterning apparatus to the deposited layer of particles.