公开(公告)号：US20250021012A1

公开(公告)日：2025-01-16

申请号：US18577035

申请日：2022-06-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Jasper WINTERS ,  Erwin John VAN ZWET ,  Marcus Johannes VAN DER LANS ,  Pieter, Willem Herman DE JAGER ,  Emiel Anton VAN DE VEN

IPC: G03F7/00

Abstract: A method of use for a lithographic tool includes scanning a substrate relative to a first micro-lens array (MLA) and a second MLA each having rows of lenslets. The first MLA has functional lenslets and extra lenslets and the scanning includes delivering light through the lenslets of the first MLA and second MLA to the substrate. The delivering includes delivering light through the functional lenslets to form a pattern on the substrate, the pattern having gaps caused by a positional or rotational misalignment between the functional lenslets of the first MLA and the second MLA. The delivering also includes delivering light through the extra lenslets to fill the gaps in the pattern.