公开(公告)号：US20230061967A1

公开(公告)日：2023-03-02

申请号：US17793726

申请日：2020-12-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Erwin John VAN ZWET

IPC: G03F7/20

Abstract: Method of exposing a substrate by a patterned radiation beam, comprising: —providing a radiation beam; —imparting the radiation beam by an array of individually controllable elements; —generating, from the radiation beam, a patterned radiation beam, by tilting the individually controllable elements between different positions about a tilting axis; —projecting the patterned radiation beam towards a substrate; —scanning a substrate across the patterned radiation beam in a scanning direction so as to expose the substrate to the patterned radiation beam, whereby the tilting axis of the individually controllable elements is substantially perpendicular to the scanning direction.

公开(公告)号：US20240160110A1

公开(公告)日：2024-05-16

申请号：US18420091

申请日：2024-01-23

Applicant: ASML Netherlands B.V.

Inventor： Jasper WINTERS ,  Erwin John VAN ZWET ,  Marcus Johannes VAN DER LANS ,  Pieter Willem Herman DE JAGER ,  Geerten Frans Ijsbrand KRAMER

IPC: G03F7/00

CPC classification number: G03F7/70291 ,  G03F7/70508 ,  G03F7/70558

Abstract: A method for improved sequencing of light delivery in a lithographic process includes determining a sequence of intensities of light to be delivered that includes an interval within the sequence of intensities where substantially no light is delivered to the substrate and delivering light to a substrate by a light source utilizing a digital mirror device (DMD) according to the sequence of intensities.

公开(公告)号：US20250021012A1

公开(公告)日：2025-01-16

申请号：US18577035

申请日：2022-06-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Jasper WINTERS ,  Erwin John VAN ZWET ,  Marcus Johannes VAN DER LANS ,  Pieter, Willem Herman DE JAGER ,  Emiel Anton VAN DE VEN

IPC: G03F7/00

Abstract: A method of use for a lithographic tool includes scanning a substrate relative to a first micro-lens array (MLA) and a second MLA each having rows of lenslets. The first MLA has functional lenslets and extra lenslets and the scanning includes delivering light through the lenslets of the first MLA and second MLA to the substrate. The delivering includes delivering light through the functional lenslets to form a pattern on the substrate, the pattern having gaps caused by a positional or rotational misalignment between the functional lenslets of the first MLA and the second MLA. The delivering also includes delivering light through the extra lenslets to fill the gaps in the pattern.

公开(公告)号：US20240329548A1

公开(公告)日：2024-10-03

申请号：US18415586

申请日：2024-01-17

Applicant: ASML Netherlands B.V.

Inventor： Jasper WINTERS ,  Erwin John VAN ZWET ,  Marcus Johannes VAN DER LANS ,  Pieter Willem Herman DE JAGER ,  Emiel Anton VAN DE VEN

IPC: G03F7/00

CPC classification number: G03F7/70833 ,  G03F7/70791 ,  G03F7/70891

Abstract: Systems and methods are disclosed for stabilizing an optical column. One system can include an optical column; a frame configured to support the optical column, the frame having a first coefficient of thermal expansion (CTE); and a subframe configured to be coupled to the optical column in at least two places by a first anchor and a second anchor to stabilize the optical column against a displacement or a rotation caused by thermal expansion in the frame or the optical column, the subframe having a second CTE lower than the first CTE.

公开(公告)号：US20150370177A1

公开(公告)日：2015-12-24

申请号：US14839663

申请日：2015-08-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Erwin John VAN ZWET ,  Pieter Willem Herman DE JAGER ,  Johannes ONVLEE ,  Erik Christiaan FRITZ

IPC: G03F7/20

CPC classification number: G03F7/70366 ,  G03F7/70275 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70491 ,  G03F7/70883

Abstract: A lithographic apparatus having an optical column capable of creating a pattern on a target portion of a substrate is disclosed. The optical column may have a self-emissive contrast device configured to emit a beam, and a projection system configured to project the beam onto the target portion. The apparatus may also have an actuator to move the optical column or a part thereof with respect to the substrate. The apparatus may be constructed to reduce the optical effect of density variation in a medium around the moving part of the optical column on the beam.

Abstract translation: 公开了一种具有能够在基板的目标部分上形成图案的光学柱的光刻设备。 光学柱可以具有被配置为发射光束的自发射对比度装置，以及被配置为将光束投射到目标部分上的投影系统。 该装置还可以具有致动器以相对于基板移动光学柱或其一部分。 该装置可以被构造成减小在光束上的光学柱的移动部分周围的介质中的密度变化的光学效应。