公开(公告)号：USRE48046E1

公开(公告)日：2020-06-09

申请号：US14469544

申请日：2014-08-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Pieter Kruit ,  Erwin Slot ,  Tijs Frans Teepen ,  Marco Jan-Jaco Wieland ,  Stijn Willem Herman Karel Steenbrink

IPC: H01J3/00 ,  H01J37/304 ,  B82Y10/00 ,  H01J37/317 ,  B82Y40/00

Abstract: Lithography system, sensor and method for measuring properties of a massive amount of charged particle beams of a charged particle beam system, in particular a direct write lithography system, in which the charged particle beams are converted into light beams by using a converter element, using an array of light sensitive detectors such as diodes, CCD or CMOS devices, located in line with said converter element, for detecting said light beams, electronically reading out resulting signals from said detectors after exposure thereof by said light beams, utilizing said signals for determining values for one or more beam properties, thereby using an automated electronic calculator, and electronically adapting the charged particle system so as to correct for out of specification range values for all or a number of said charged particle beams, each for one or more properties, based on said calculated property values.

公开(公告)号：USRE49602E1

公开(公告)日：2023-08-08

申请号：US16896953

申请日：2020-09-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Pieter Kruit ,  Erwin Slot ,  Tijs Frans Teepen ,  Marco Jan-Jaco Wieland ,  Stijn Willem Herman Karel Steenbrink

IPC: H01J3/00 ,  H01J37/317 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/304

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3045 ,  H01J2237/2443 ,  H01J2237/2446 ,  H01J2237/30433 ,  H01J2237/31757

Abstract: Lithography system, sensor and method for measuring properties of a massive amount of charged particle beams of a charged particle beam system, in particular a direct write lithography system, in which



the charged particle beams are converted into light beams by using a converter element,
using an array of light sensitive detectors such as diodes, CCD or CMOS devices, located in line with said converter element, for detecting said light beams,
electronically reading out resulting signals from said detectors after exposure thereof by said light beams,
utilizing said signals for determining values for one or more beam properties, thereby using an automated electronic calculator, and
electronically adapting the charged particle system so as to correct for out of specification range values for all or a number of said charged particle beams, each for one or more properties, based on said calculated property values.

公开(公告)号：USRE49488E1

公开(公告)日：2023-04-11

申请号：US16427295

申请日：2019-05-30

Applicant: ASML Netherlands B.V.

Inventor： Guido De Boer ,  Michel Pieter Dansberg ,  Pieter Kruit

IPC: G03F7/20

Abstract: The invention relates to a lithography system, for example for projecting an image or an image pattern on to a target (1) such as a wafer, said target being included in said system by means of a target table (2), clamping means being present for clamping said target on said table. Said clamping means comprises a layer of stationary liquid (3), included at such thickness between target and target table that, provided the material of the liquid (C) and of the respective contacting faces (A, B) of the target (1) and target table (2), a pressure drop (PCap) arises.