公开(公告)号：US20230273528A1

公开(公告)日：2023-08-31

申请号：US18018034

申请日：2021-07-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Rencheng SUN ,  Qi JIA ,  Meng LIU ,  Weixuan HU ,  Jen-Yi WUU ,  Hao CHEN

IPC: G03F7/20 ,  G03F7/00 ,  G06N20/00 ,  G05B19/4099

CPC classification number: G03F7/705 ,  G03F7/70441 ,  G03F7/706841 ,  G06N20/00 ,  G05B19/4099 ,  G05B2219/45031

Abstract: A method for selecting patterns for training a model to predict patterns to be printed on a substrate. The method includes (a) obtaining images of multiple patterns, wherein the multiple patterns correspond to target patterns to be printed on a substrate; (b) grouping the images into a group of special patterns and multiple groups of main patterns; and (c) outputting a set of patterns based on the images as training data for training the model, wherein the set of patterns includes the group of special patterns and a representative main pattern from each group of main patterns.