公开(公告)号：US20220351359A1

公开(公告)日：2022-11-03

申请号：US17268128

申请日：2019-07-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Chen ZHANG ,  Qiang ZHANG ,  Jen-Shiang WANG ,  Jiao LIANG

IPC: G06T7/00 ,  G03F7/20 ,  G01N23/2251

Abstract: A method for evaluating images of a printed pattern. The method includes obtaining a first averaged image of the printed pattern, where the first averaged image is generated by averaging raw images of the printed pattern. The method also includes identifying one or more features of the first averaged image. The method further includes evaluating the first averaged image, using an image quality classification model and based at least on the one or more features. The evaluating includes determining, by the image quality classification model, whether the first averaged image satisfies a metric.

公开(公告)号：US20210208507A1

公开(公告)日：2021-07-08

申请号：US17059771

申请日：2019-05-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Jen-Shiang WANG ,  Qian Zhao ,  Yunbo GUO ,  Yen-Wen LU ,  Mu FENG ,  Qiang ZHANG

IPC: G03F7/20

Abstract: A method for improving a process model for a patterning process, the method including obtaining a) a measured contour from an image capture device, and b) a simulated contour generated from a simulation of the process model. The method also includes aligning the measured contour with the simulated contour by determining an offset between the measured contour and the simulated contour. The process model is calibrated to reduce a difference, computed based on the determined offset, between the simulated contour and the measured contour.

公开(公告)号：US20250078244A1

公开(公告)日：2025-03-06

申请号：US18952713

申请日：2024-11-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Chen ZHANG ,  Qiang ZHANG ,  Jen-Shiang WANG ,  Jiao LIANG

IPC: G06T7/00 ,  G01N23/2251 ,  G03F7/00

Abstract: A method for evaluating images of a printed pattern. The method includes obtaining a first averaged image of the printed pattern, where the first averaged image is generated by averaging raw images of the printed pattern. The method also includes identifying one or more features of the first averaged image. The method further includes evaluating the first averaged image, using an image quality classification model and based at least on the one or more features. The evaluating includes determining, by the image quality classification model, whether the first averaged image satisfies a metric.

公开(公告)号：US20220404712A1

公开(公告)日：2022-12-22

申请号：US17772529

申请日：2020-10-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Qiang ZHANG ,  Yunbo GUO ,  Yu CAO ,  Jen-Shiang WANG ,  Yen-Wen LU ,  Danwu CHEN ,  Pengcheng YANG ,  Haoyi LIANG ,  Zhichao CHEN ,  Lingling PU

IPC: G03F7/20 ,  G06V10/774 ,  G06V10/82 ,  G06T7/32 ,  G06T7/33

Abstract: A method for training a machine learning model to generate a predicted measured image, the method including obtaining (a) an input target image associated with a reference design pattern, and (b) a reference measured image associated with a specified design pattern printed on a substrate, wherein the input target image and the reference measured image are non-aligned images; and training, by a hardware computer system and using the input target image, the machine learning model to generate a predicted measured image.

公开(公告)号：US20210263426A1

公开(公告)日：2021-08-26

申请号：US17256332

申请日：2019-06-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Jiao LIANG ,  Chen ZHANG ,  Qiang ZHANG ,  Yunbo GUO

IPC: G03F7/20

Abstract: A method for improving a process model by measuring a feature on a printed design that was constructed based in part on a target design is disclosed. The method includes obtaining a) an image of the printed design from an image capture device and b) contours based on shapes in the image. The method also includes identifying, by a pattern recognition program, patterns on the target design that include the feature and determining coordinates, on the contours, that correspond to the feature. The method further includes improving the process model by at least a) providing a measurement of the feature based on the coordinates and b) calibrating the process model based on a comparison of the measurement with a corresponding feature in the target design.