公开(公告)号：US20230244152A1

公开(公告)日：2023-08-03

申请号：US18008075

申请日：2021-06-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Jen-Shiang WANG ,  Pengcheng YANG ,  Jiao HUANG ,  Yen-Wen LU ,  Liang LIU ,  Chen ZHANG

IPC: G03F7/00 ,  G03F1/70 ,  G03F7/105

CPC classification number: G03F7/706843 ,  G03F1/70 ,  G03F7/705 ,  G03F7/105

Abstract: A method for determining a likelihood that an assist feature of a mask pattern will print on a substrate. The method includes obtaining (i) a plurality of images of a pattern printed on a substrate and (ii) variance data the plurality of images of the pattern; determining, based on the variance data, a model configured to generate variance data associated with the mask pattern; and determining, based on model-generated variance data for a given mask pattern and a resist image or etch image associated with the given mask pattern, the likelihood that an assist feature of the given mask pattern will be printed on the substrate. The likelihood can be applied to adjust one or more parameters related to a patterning process or a patterning apparatus to reduce the likelihood that the assist feature will print on the substrate.

公开(公告)号：US20210048751A1

公开(公告)日：2021-02-18

申请号：US16977137

申请日：2019-03-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Hongfei SHI ,  Jinze WANG ,  Pengcheng YANG ,  Lei WANG ,  Mu FENG

IPC: G03F7/20

Abstract: A method for accelerating calibration of a fabrication process model, the method including performing one or more iterations of: defining one or more fabrication process model terms; receiving predetermined information related to the one or more fabrication process model terms; generating a fabrication process model based on the predetermined information, the fabrication process model configured to generate one or more predictions related to a metrology gauge; determining whether a prediction related to a dimension of a gauge is within a predetermined threshold of the gauge as measured on a post-fabrication process substrate; and responsive to the prediction not breaching the predetermined threshold, optimizing the one or more fabrication process terms such that the prediction related to the dimension of the gauge is within the predetermined threshold of the gauge as measured on the post-fabrication process substrate.

公开(公告)号：US20220404712A1

公开(公告)日：2022-12-22

申请号：US17772529

申请日：2020-10-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Qiang ZHANG ,  Yunbo GUO ,  Yu CAO ,  Jen-Shiang WANG ,  Yen-Wen LU ,  Danwu CHEN ,  Pengcheng YANG ,  Haoyi LIANG ,  Zhichao CHEN ,  Lingling PU

IPC: G03F7/20 ,  G06V10/774 ,  G06V10/82 ,  G06T7/32 ,  G06T7/33

Abstract: A method for training a machine learning model to generate a predicted measured image, the method including obtaining (a) an input target image associated with a reference design pattern, and (b) a reference measured image associated with a specified design pattern printed on a substrate, wherein the input target image and the reference measured image are non-aligned images; and training, by a hardware computer system and using the input target image, the machine learning model to generate a predicted measured image.