公开(公告)号：US20240061346A1

公开(公告)日：2024-02-22

申请号：US18270644

申请日：2021-12-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Thomas THEEUWES ,  Jochem Sebastiaan WILDENBERG ,  Lei ZHANG ,  Ronald VAN ITHERSUM

IPC: G03F7/00

CPC classification number: G03F7/706837 ,  G03F7/706839

Abstract: Disclosed is a method of determining a performance parameter or a parameter derived therefrom, the performance parameter being associated with a performance of a lithographic process for forming one or more structures on a substrate subject to the lithographic process. The method comprises obtaining a probability description distribution comprising a plurality of probability descriptions of the performance parameter, each probability description corresponding to a different position on the substrate and decomposing each probability description into a plurality of component probability descriptions to obtain a plurality of component probability description distributions. A component across-substrate-area model is determined for each of said plurality of component probability descriptions, which models its respective component probability description across a substrate area; and a value for said performance parameter or parameter derived therefrom is determined based on the component across-substrate-area models.