公开(公告)号：US12055478B2

公开(公告)日：2024-08-06

申请号：US17563867

申请日：2021-12-28

申请人： ASML NETHERLANDS B.V.

发明人： Andrey Nikipelov ,  Saeedeh Farokhipoor ,  Maarten Van Kampen

IPC分类号： G01N21/15 ,  G01N21/88 ,  G01N21/95 ,  G02B1/18 ,  G02B5/08

CPC分类号： G01N21/15 ,  G01N21/8806 ,  G01N21/9501 ,  G02B1/18 ,  G02B5/0891

摘要： A method and apparatus for cleaning vacuum ultraviolet (VUV) optics (e.g., one or more mirrors of a VUV) of a substrate inspection system is disclosed. The cleaning system ionizes or disassociates hydrogen gas in a VUV optics environment to generate hydrogen radicals (e.g., H*) or ions (e.g., H+, H2+, H3+, which remove water or hydrocarbons from the surface of the one or more mirrors. The one or more VUV mirrors may include a reflective material, such as aluminum. The one or more VUV mirrors may have a protective coating to protect the reflective material from any detrimental reaction to the hydrogen radicals or ions. The protective coating may include a noble metal.

公开(公告)号：US20240353315A1

公开(公告)日：2024-10-24

申请号：US18759703

申请日：2024-06-28

申请人： ASML NETHERLANDS B.V.

发明人： Andrey Nikipelov ,  Saeedeh Farokhipoor ,  Maarten Van Kampen

IPC分类号： G01N21/15 ,  G01N21/88 ,  G01N21/95 ,  G02B1/18 ,  G02B5/08

CPC分类号： G01N21/15 ,  G01N21/8806 ,  G01N21/9501 ,  G02B1/18 ,  G02B5/0891

摘要： A method and apparatus for cleaning vacuum ultraviolet (VUV) optics (e.g., one or more mirrors of a VUV) of a substrate inspection system is disclosed. The cleaning system ionizes or disassociates hydrogen gas in a VUV optics environment to generate hydrogen radicals (e.g., H*) or ions (e.g., H+, H2+, H3+), which remove water or hydrocarbons from the surface of the one or more mirrors. The one or more VUV mirrors may include a reflective material, such as aluminum. The one or more VUV mirrors may have a protective coating to protect the reflective material from any detrimental reaction to the hydrogen radicals or ions. The protective coating may include a noble metal.

公开(公告)号：US20220205900A1

公开(公告)日：2022-06-30

申请号：US17563867

申请日：2021-12-28

申请人： ASML NETHERLANDS B.V.

发明人： Andrey NIKIPELOV ,  Saeedeh Farokhipoor ,  Maarten Van Kampen

IPC分类号： G01N21/15 ,  G02B1/18 ,  G01N21/95 ,  G02B5/08 ,  G01N21/88

摘要： A method and apparatus for cleaning vacuum ultraviolet (VUV) optics (e.g., one or more mirrors of a VUV) of a substrate inspection system is disclosed. The cleaning system ionizes or disassociates hydrogen gas in a VUV optics environment to generate hydrogen radicals (e.g., H*) or ions (e.g., H+, H2+, H3+, which remove water or hydrocarbons from the surface of the one or more mirrors. The one or more VUV mirrors may include a reflective material, such as aluminum. The one or more VUV mirrors may have a protective coating to protect the reflective material from any detrimental reaction to the hydrogen radicals or ions. The protective coating may include a noble metal.